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Title: Growth of lattice-matched GaInAsP grown on vicinal GaAs(001) substrates within the miscibility gap for solar cells

Abstract

The growth of quaternary Ga0.68In0.32As0.35P0.65 by metal-organic vapor phase epitaxy is very sensitive to growth conditions because the composition is within a miscibility gap. In this investigation, we fabricated 1 um-thick lattice-matched GaInAsP films grown on GaAs(001) for application to solar cells. In order to characterize the effect of the surface diffusion of adatoms on the material quality of alloys, the growth temperature and substrate miscut are varied. Transmission electron microscopy and two-dimensional in-situ multi-beam optical stress determine that growth temperatures of 650 degrees C and below enhance the formation of the CuPtB atomic ordering and suppress material decomposition, which is found to occur at the growth surface. The root-mean-square (RMS) roughness is reduced from 33.6 nm for 750 degrees C to 1.62 nm for 650 degrees C, determined by atomic force microscopy. Our initial investigations show that the RMS roughness can be further reduced using increased miscut angle, and substrates miscut toward (111)A, leading to an RMS roughness of 0.56 nm for the sample grown at 600 degrees C on GaAs miscut 6 degrees toward (111)A. Using these conditions, we fabricate an inverted hetero-junction 1.62 eV Ga0.68In0.32As0.35P0.65 solar cell without an anti-reflection coating with a short-circuit current density, open-circuitmore » voltage, fill factor, and efficiency of 12.23 mA/cm2, 1.12 V, 86.18%, and 11.80%, respectively.« less

Authors:
 [1];  [2];  [2];  [2];  [2]
  1. National Renewable Energy Lab. (NREL), Golden, CO (United States); National Inst. of Advanced Industrial Science and Technology (AIST), Tsukuba (Japan)
  2. National Renewable Energy Lab. (NREL), Golden, CO (United States)
Publication Date:
Research Org.:
National Renewable Energy Lab. (NREL), Golden, CO (United States)
Sponsoring Org.:
USDOE Office of Energy Efficiency and Renewable Energy (EERE)
OSTI Identifier:
1334744
Alternate Identifier(s):
OSTI ID: 1396675
Report Number(s):
NREL/JA-5J00-67514
Journal ID: ISSN 0022-0248
Grant/Contract Number:  
AC36-08GO28308
Resource Type:
Accepted Manuscript
Journal Name:
Journal of Crystal Growth
Additional Journal Information:
Journal Volume: 458; Journal ID: ISSN 0022-0248
Publisher:
Elsevier
Country of Publication:
United States
Language:
English
Subject:
14 SOLAR ENERGY; 36 MATERIALS SCIENCE; metalorganic vapor phase epitaxy; alloys; semiconducting quaternary alloys; solar cells

Citation Formats

Oshima, Ryuji, France, Ryan M., Geisz, John F., Norman, Andrew G., and Steiner, Myles A. Growth of lattice-matched GaInAsP grown on vicinal GaAs(001) substrates within the miscibility gap for solar cells. United States: N. p., 2016. Web. doi:10.1016/j.jcrysgro.2016.10.025.
Oshima, Ryuji, France, Ryan M., Geisz, John F., Norman, Andrew G., & Steiner, Myles A. Growth of lattice-matched GaInAsP grown on vicinal GaAs(001) substrates within the miscibility gap for solar cells. United States. https://doi.org/10.1016/j.jcrysgro.2016.10.025
Oshima, Ryuji, France, Ryan M., Geisz, John F., Norman, Andrew G., and Steiner, Myles A. Thu . "Growth of lattice-matched GaInAsP grown on vicinal GaAs(001) substrates within the miscibility gap for solar cells". United States. https://doi.org/10.1016/j.jcrysgro.2016.10.025. https://www.osti.gov/servlets/purl/1334744.
@article{osti_1334744,
title = {Growth of lattice-matched GaInAsP grown on vicinal GaAs(001) substrates within the miscibility gap for solar cells},
author = {Oshima, Ryuji and France, Ryan M. and Geisz, John F. and Norman, Andrew G. and Steiner, Myles A.},
abstractNote = {The growth of quaternary Ga0.68In0.32As0.35P0.65 by metal-organic vapor phase epitaxy is very sensitive to growth conditions because the composition is within a miscibility gap. In this investigation, we fabricated 1 um-thick lattice-matched GaInAsP films grown on GaAs(001) for application to solar cells. In order to characterize the effect of the surface diffusion of adatoms on the material quality of alloys, the growth temperature and substrate miscut are varied. Transmission electron microscopy and two-dimensional in-situ multi-beam optical stress determine that growth temperatures of 650 degrees C and below enhance the formation of the CuPtB atomic ordering and suppress material decomposition, which is found to occur at the growth surface. The root-mean-square (RMS) roughness is reduced from 33.6 nm for 750 degrees C to 1.62 nm for 650 degrees C, determined by atomic force microscopy. Our initial investigations show that the RMS roughness can be further reduced using increased miscut angle, and substrates miscut toward (111)A, leading to an RMS roughness of 0.56 nm for the sample grown at 600 degrees C on GaAs miscut 6 degrees toward (111)A. Using these conditions, we fabricate an inverted hetero-junction 1.62 eV Ga0.68In0.32As0.35P0.65 solar cell without an anti-reflection coating with a short-circuit current density, open-circuit voltage, fill factor, and efficiency of 12.23 mA/cm2, 1.12 V, 86.18%, and 11.80%, respectively.},
doi = {10.1016/j.jcrysgro.2016.10.025},
journal = {Journal of Crystal Growth},
number = ,
volume = 458,
place = {United States},
year = {Thu Oct 13 00:00:00 EDT 2016},
month = {Thu Oct 13 00:00:00 EDT 2016}
}

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Works referencing / citing this record:

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Growth of InGaAs Solar Cells on InP(001) Miscut Substrates Using Solid‐Source Molecular Beam Epitaxy
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