Combining reactive sputtering and rapid thermal processing for synthesis and discovery of metal oxynitrides

Zhou, Lan; Suram, Santosh K.; Becerra-Stasiewicz, Natalie; Mitrovic, Slobodan; Kan, Kevin; Jones, Ryan J. R.; Gregoire, John M.

doi:10.1557/jmr.2015.140

Title: Combining reactive sputtering and rapid thermal processing for synthesis and discovery of metal oxynitrides

Abstract

Recent efforts have demonstrated enhanced tailoring of material functionality with mixed-anion materials, yet exploratory research with mixed-anion chemistries is limited by the sensitivity of these materials to synthesis conditions. In order to synthesize a particular metal oxynitride compound by traditional reactive annealing we require specific, limited ranges of both oxygen and nitrogen chemical potentials in order to establish equilibrium between the solid-state material and a reactive atmosphere. While using Ta-O-N as an example system, we describe a combination of reactive sputter deposition and rapid thermal processing for synthesis of mixed-anion inorganic materials. Heuristic optimization of reactive gas pressures to attain a desired anion stoichiometry is discussed, and the ability of rapid thermal processing to enable amorphous to crystalline transitions without preferential anion loss is demonstrated through the controlled synthesis of nitride, oxide and oxynitride phases.

Authors:

Zhou, Lan ^[1]; Suram, Santosh K. ^[1]; Becerra-Stasiewicz, Natalie ^[1]; Mitrovic, Slobodan ^[1]; Kan, Kevin ^[1]; Jones, Ryan J. R. ^[1];

^[1]

California Inst. of Technology (CalTech), Pasadena, CA (United States). Joint Center for Artificial Photosynthesis (JCAP)

Publication Date:: Wed May 27 00:00:00 EDT 2015

Research Org.:: California Institute of Technology (CalTech), Pasadena, CA (United States). Joint Center for Artificial Photosynthesis (JCAP)

Sponsoring Org.:: USDOE

OSTI Identifier:: 1334193

Grant/Contract Number:: SC0004993

Resource Type:: Accepted Manuscript

Journal Name:: Journal of Materials Research

Additional Journal Information:: Journal Volume: 30; Journal Issue: 19; Journal ID: ISSN 0884-2914

Publisher:: Materials Research Society

Country of Publication:: United States

Language:: English

Subject:: 36 MATERIALS SCIENCE; oxynitrides; sputtering; rapid thermal processing; mixed anion synthesis

Citation Formats


                    Zhou, Lan, Suram, Santosh K., Becerra-Stasiewicz, Natalie, Mitrovic, Slobodan, Kan, Kevin, Jones, Ryan J. R., and Gregoire, John M. Combining reactive sputtering and rapid thermal processing for synthesis and discovery of metal oxynitrides.  United States: N. p., 2015. 
Web.  doi:10.1557/jmr.2015.140.

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                    Zhou, Lan, Suram, Santosh K., Becerra-Stasiewicz, Natalie, Mitrovic, Slobodan, Kan, Kevin, Jones, Ryan J. R., & Gregoire, John M. Combining reactive sputtering and rapid thermal processing for synthesis and discovery of metal oxynitrides.  United States.  https://doi.org/10.1557/jmr.2015.140

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                    Zhou, Lan, Suram, Santosh K., Becerra-Stasiewicz, Natalie, Mitrovic, Slobodan, Kan, Kevin, Jones, Ryan J. R., and Gregoire, John M. Wed .  
"Combining reactive sputtering and rapid thermal processing for synthesis and discovery of metal oxynitrides".  United States.  https://doi.org/10.1557/jmr.2015.140.  https://www.osti.gov/servlets/purl/1334193.

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@article{osti_1334193,

  title        = {Combining reactive sputtering and rapid thermal processing for synthesis and discovery of metal oxynitrides},

  author       = {Zhou, Lan and Suram, Santosh K. and Becerra-Stasiewicz, Natalie and Mitrovic, Slobodan and Kan, Kevin and Jones, Ryan J. R. and Gregoire, John M.},

  abstractNote = {Recent efforts have demonstrated enhanced tailoring of material functionality with mixed-anion materials, yet exploratory research with mixed-anion chemistries is limited by the sensitivity of these materials to synthesis conditions. In order to synthesize a particular metal oxynitride compound by traditional reactive annealing we require specific, limited ranges of both oxygen and nitrogen chemical potentials in order to establish equilibrium between the solid-state material and a reactive atmosphere. While using Ta-O-N as an example system, we describe a combination of reactive sputter deposition and rapid thermal processing for synthesis of mixed-anion inorganic materials. Heuristic optimization of reactive gas pressures to attain a desired anion stoichiometry is discussed, and the ability of rapid thermal processing to enable amorphous to crystalline transitions without preferential anion loss is demonstrated through the controlled synthesis of nitride, oxide and oxynitride phases.},

  doi          = {10.1557/jmr.2015.140},

  journal      = {Journal of Materials Research},

  number       = 19,

  volume       = 30,

  place        = {United States},

  year         = {Wed May 27 00:00:00 EDT 2015},

  month        = {Wed May 27 00:00:00 EDT 2015}

}

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Works referencing / citing this record:

Tracking materials science data lineage to manage millions of materials experiments and analyses
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Soedarmadji, Edwin; Stein, Helge S.; Suram, Santosh K.
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$ \newcommand{\bt}{\beta} \bt$ -TaON thin films: production by reactive magnetron sputtering and the question of non-stoichiometry
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Title: Combining reactive sputtering and rapid thermal processing for synthesis and discovery of metal oxynitrides

Abstract

Citation Formats

Perovskite-related oxynitrides – Recent developments in synthesis, characterisation and investigations of physical properties journal, December 2009

Structural, optical, and electrical properties of WOx(Ny) films deposited by reactive dual magnetron sputtering journal, December 2006

Titanium oxynitride thin films sputter deposited by the reactive gas pulsing process journal, April 2007

Anion order in perovskite oxynitrides journal, November 2010

Multi-technique characterization of tantalum oxynitride films prepared by reactive direct current magnetron sputtering journal, August 2006

Effect of reactive gases flow ratios on the microstructure and electrical resistivity of Ta–N–O thin films by reactive co-sputtering journal, May 2011

Solar Water Splitting Cells journal, November 2010

Formation of niobium oxynitrides by rapid thermal processing (RTP) journal, September 2005

Influence of nitrogen content on properties of direct current sputtered TiOxNy films journal, January 2004

Deposition of zirconium oxynitride films by reactive cathodic arc evaporation and investigation of physical properties journal, February 2008

An oxynitride, TaON, as an efficient water oxidation photocatalyst under visible light irradiation (λ ≤ 500 nm) journal, January 2002

Intercalation Route to Complex Perovskites AM 0.2 Ta 0.8 O 2.8 N 0.2 (A = Sr, Ba; M = Li, Na): Neutron Diffraction and Nuclear Magnetic Resonance Study journal, December 2014

Interaction of superconductivity and magnetism in borocarbide superconductors journal, July 2001

Superconductivity in La T M BN and La 3 T M 2 B 2 N 3 ( T M = Transition Metal) Synthesized under High Pressure journal, January 2012

The mechanism of reactive sputtering journal, September 1968

Perovskite-related Oxynitrides in Photocatalysis journal, March 2013

Processing and properties of (Mo,Cr) oxycarbides from MOCVD journal, March 1998

Development of tantalum oxynitride thin films produced by PVD: Study of structural stability journal, November 2013

Transparent p -type semiconductor: LaCuOS layered oxysulfide journal, October 2000

Growth of single crystalline TaON on yttria-stabilized zirconia (YSZ) journal, August 2013

High thermoelectric performance of oxyselenides: intrinsically low thermal conductivity of Ca-doped BiCuSeO journal, May 2013

Optical Properties of (Oxy)Nitride Materials: A Review journal, March 2013

Investigation of zirconium oxynitride thin films deposited by reactive pulsed magnetron sputtering journal, November 2007

Recent progress in the development of (oxy)nitride photocatalysts for water splitting under visible-light irradiation journal, July 2013

Structural analysis and characterization of layer perovskite oxynitrides made from Dion–Jacobson oxide precursors journal, July 2005

Growth and characterization of zirconium oxynitride films prepared by reactive direct current magnetron sputtering journal, September 2002

Effect of power variation on wettability and optical properties of co-sputtered titanium and zirconium oxynitride films journal, May 2013

Oxysulfide Sm 2 Ti 2 S 2 O 5 as a Stable Photocatalyst for Water Oxidation and Reduction under Visible Light Irradiation (λ ≤ 650 nm) journal, November 2002

Electronic mechanism of hardness enhancement in transition-metal carbonitrides journal, May 1999

First principles high throughput screening of oxynitrides for water-splitting photocatalysts journal, January 2013

Optical and structural properties of silicon oxynitride deposited by plasma enhanced chemical vapor deposition journal, December 2010

Applications of high throughput (combinatorial) methodologies to electronic, magnetic, optical, and energy-related materials journal, June 2013

Perovskite-related oxynitrides – Recent developments in synthesis, characterisation and investigations of physical properties journal, December 2009

Deposition of zirconium oxynitride films by reactive cathodic arc evaporation and investigation of physical properties journal, February 2008

Optical and structural properties of silicon oxynitride deposited by plasma enhanced chemical vapor deposition journal, December 2010

Tracking materials science data lineage to manage millions of materials experiments and analyses journal, July 2019

Defect Engineering for Photocatalysis: From Ternary to Perovskite Oxynitrides journal, February 2020

$ \newcommand{\bt}{\beta} \bt$ -TaON thin films: production by reactive magnetron sputtering and the question of non-stoichiometry journal, May 2019

Perovskite-related oxynitrides – Recent developments in synthesis, characterisation and investigations of physical properties
journal, December 2009

Structural, optical, and electrical properties of WOx(Ny) films deposited by reactive dual magnetron sputtering
journal, December 2006

Titanium oxynitride thin films sputter deposited by the reactive gas pulsing process
journal, April 2007

Anion order in perovskite oxynitrides
journal, November 2010

Multi-technique characterization of tantalum oxynitride films prepared by reactive direct current magnetron sputtering
journal, August 2006

Effect of reactive gases flow ratios on the microstructure and electrical resistivity of Ta–N–O thin films by reactive co-sputtering
journal, May 2011

Solar Water Splitting Cells
journal, November 2010

Formation of niobium oxynitrides by rapid thermal processing (RTP)
journal, September 2005

Influence of nitrogen content on properties of direct current sputtered TiOxNy films
journal, January 2004

Deposition of zirconium oxynitride films by reactive cathodic arc evaporation and investigation of physical properties
journal, February 2008

An oxynitride, TaON, as an efficient water oxidation photocatalyst under visible light irradiation (λ ≤ 500 nm)
journal, January 2002

Intercalation Route to Complex Perovskites AM _0.2 Ta _0.8 O _2.8 N _0.2 (A = Sr, Ba; M = Li, Na): Neutron Diffraction and Nuclear Magnetic Resonance Study
journal, December 2014

Interaction of superconductivity and magnetism in borocarbide superconductors
journal, July 2001

Superconductivity in La T _M BN and La ₃ T _{M 2} B ₂ N ₃ ( T _M = Transition Metal) Synthesized under High Pressure
journal, January 2012

The mechanism of reactive sputtering
journal, September 1968

Perovskite-related Oxynitrides in Photocatalysis
journal, March 2013

Processing and properties of (Mo,Cr) oxycarbides from MOCVD
journal, March 1998

Development of tantalum oxynitride thin films produced by PVD: Study of structural stability
journal, November 2013

Transparent p -type semiconductor: LaCuOS layered oxysulfide
journal, October 2000

Growth of single crystalline TaON on yttria-stabilized zirconia (YSZ)
journal, August 2013

High thermoelectric performance of oxyselenides: intrinsically low thermal conductivity of Ca-doped BiCuSeO
journal, May 2013

Optical Properties of (Oxy)Nitride Materials: A Review
journal, March 2013

Investigation of zirconium oxynitride thin films deposited by reactive pulsed magnetron sputtering
journal, November 2007

Recent progress in the development of (oxy)nitride photocatalysts for water splitting under visible-light irradiation
journal, July 2013

Structural analysis and characterization of layer perovskite oxynitrides made from Dion–Jacobson oxide precursors
journal, July 2005

Growth and characterization of zirconium oxynitride films prepared by reactive direct current magnetron sputtering
journal, September 2002

Effect of power variation on wettability and optical properties of co-sputtered titanium and zirconium oxynitride films
journal, May 2013

Oxysulfide Sm ₂ Ti ₂ S ₂ O ₅ as a Stable Photocatalyst for Water Oxidation and Reduction under Visible Light Irradiation (λ ≤ 650 nm)
journal, November 2002

Electronic mechanism of hardness enhancement in transition-metal carbonitrides
journal, May 1999

First principles high throughput screening of oxynitrides for water-splitting photocatalysts
journal, January 2013

Optical and structural properties of silicon oxynitride deposited by plasma enhanced chemical vapor deposition
journal, December 2010

Applications of high throughput (combinatorial) methodologies to electronic, magnetic, optical, and energy-related materials
journal, June 2013

Perovskite-related oxynitrides – Recent developments in synthesis, characterisation and investigations of physical properties
journal, December 2009

Deposition of zirconium oxynitride films by reactive cathodic arc evaporation and investigation of physical properties
journal, February 2008

Optical and structural properties of silicon oxynitride deposited by plasma enhanced chemical vapor deposition
journal, December 2010

Tracking materials science data lineage to manage millions of materials experiments and analyses
journal, July 2019

Defect Engineering for Photocatalysis: From Ternary to Perovskite Oxynitrides
journal, February 2020

$ \newcommand{\bt}{\beta} \bt$ -TaON thin films: production by reactive magnetron sputtering and the question of non-stoichiometry
journal, May 2019