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Title: Structural and thermoelectric properties of SiGe/Al multilayer systems during metal induced crystallization

Authors:
ORCiD logo [1] ;  [2] ; ORCiD logo [3] ;  [4] ;  [5] ;  [1]
  1. Institute of Physics, University of Augsburg, Universitätsstraße 1, 86159 Augsburg, Germany
  2. Evatec AG, Hauptstraße 1a, 9477 Trübbach, Switzerland
  3. O-Flexx Technologies GmbH, Auf der Höhe 49, 47059 Duisburg, Germany
  4. Helmholtz-Zentrum Berlin für Materialien und Energie GmbH, Hahn-Meitner-Platz 1, 14109 Berlin, Germany
  5. IBM T. J. Watson Research Center, Yorktown Heights, 10598 New York, USA
Publication Date:
Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Name: Journal of Applied Physics Journal Volume: 120 Journal Issue: 20; Journal ID: ISSN 0021-8979
Publisher:
American Institute of Physics
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
OSTI Identifier:
1333974