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Title: Molecular dynamics simulations of substitutional diffusion

Abstract

In atomistic simulations, diffusion energy barriers are usually calculated for each atomic jump path using a nudged elastic band method. Practical materials often involve thousands of distinct atomic jump paths that are not known a priori. Hence, it is often preferred to determine an overall diffusion energy barrier and an overall pre-exponential factor from the Arrhenius equation constructed through molecular dynamics simulations of mean square displacement of the diffusion species at different temperatures. This approach has been well established for interstitial diffusion, but not for substitutional diffusion at the same confidence. Using In 0.1 Ga 0.9 N as an example, we have identified conditions where molecular dynamics simulations can be used to calculate highly converged Arrhenius plots for substitutional alloys. As a result, this may enable many complex diffusion problems to be easily and reliably studied in the future using molecular dynamics, provided that moderate computing resources are available.

Authors:
 [1];  [1];  [1]
  1. Sandia National Lab. (SNL-CA), Livermore, CA (United States)
Publication Date:
Research Org.:
Sandia National Lab. (SNL-CA), Livermore, CA (United States)
Sponsoring Org.:
USDOE National Nuclear Security Administration (NNSA)
OSTI Identifier:
1333612
Alternate Identifier(s):
OSTI ID: 1550638
Report Number(s):
SAND-2016-7921J
Journal ID: ISSN 0927-0256; PII: S0927025616306085
Grant/Contract Number:  
AC04-94AL85000; 180899
Resource Type:
Accepted Manuscript
Journal Name:
Computational Materials Science
Additional Journal Information:
Journal Name: Computational Materials Science; Journal ID: ISSN 0927-0256
Publisher:
Elsevier
Country of Publication:
United States
Language:
English
Subject:
74 ATOMIC AND MOLECULAR PHYSICS; diffusion; molecular dynamics; semiconductor compound

Citation Formats

Zhou, Xiaowang, Jones, Reese E., and Gruber, Jacob. Molecular dynamics simulations of substitutional diffusion. United States: N. p., 2016. Web. doi:10.1016/j.commatsci.2016.11.047.
Zhou, Xiaowang, Jones, Reese E., & Gruber, Jacob. Molecular dynamics simulations of substitutional diffusion. United States. https://doi.org/10.1016/j.commatsci.2016.11.047
Zhou, Xiaowang, Jones, Reese E., and Gruber, Jacob. Sun . "Molecular dynamics simulations of substitutional diffusion". United States. https://doi.org/10.1016/j.commatsci.2016.11.047. https://www.osti.gov/servlets/purl/1333612.
@article{osti_1333612,
title = {Molecular dynamics simulations of substitutional diffusion},
author = {Zhou, Xiaowang and Jones, Reese E. and Gruber, Jacob},
abstractNote = {In atomistic simulations, diffusion energy barriers are usually calculated for each atomic jump path using a nudged elastic band method. Practical materials often involve thousands of distinct atomic jump paths that are not known a priori. Hence, it is often preferred to determine an overall diffusion energy barrier and an overall pre-exponential factor from the Arrhenius equation constructed through molecular dynamics simulations of mean square displacement of the diffusion species at different temperatures. This approach has been well established for interstitial diffusion, but not for substitutional diffusion at the same confidence. Using In 0.1 Ga 0.9 N as an example, we have identified conditions where molecular dynamics simulations can be used to calculate highly converged Arrhenius plots for substitutional alloys. As a result, this may enable many complex diffusion problems to be easily and reliably studied in the future using molecular dynamics, provided that moderate computing resources are available.},
doi = {10.1016/j.commatsci.2016.11.047},
journal = {Computational Materials Science},
number = ,
volume = ,
place = {United States},
year = {Sun Dec 18 00:00:00 EST 2016},
month = {Sun Dec 18 00:00:00 EST 2016}
}

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Cited by: 18 works
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Works referencing / citing this record:

Effect of indium doping on motions of 〈 a 〉-prismatic edge dislocations in wurtzite gallium nitride
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