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Title: Near-field radiative heat transfer between doped-Si parallel plates separated by a spacing down to 200 nm

Authors:
 [1] ;  [1] ;  [1]
  1. George W. Woodruff School of Mechanical Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332, USA
Publication Date:
Grant/Contract Number:
FG02-06ER46343
Type:
Publisher's Accepted Manuscript
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Volume: 109; Journal Issue: 20; Related Information: CHORUS Timestamp: 2018-03-09 12:09:19; Journal ID: ISSN 0003-6951
Publisher:
American Institute of Physics
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
OSTI Identifier:
1332366