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Title: Ultrathin IBAD MgO films for epitaxial growth on amorphous substrates and sub-50 nm membranes

Abstract

Here, a fabrication process has been developed for high energy ion beam assisted deposition (IBAD) biaxial texturing of ultrathin (~1 nm) MgO films, using a high ion-to-atom ratio and post-deposition annealing instead of a homoepitaxial MgO layer. These films serve as the seed layer for epitaxial growth of materials on amorphous substrates such as electron/X-ray transparent membranes or nanocalorimetry devices. Stress measurements and atomic force microscopy of the MgO films reveal decreased stress and surface roughness, while X-ray diffraction of epitaxial overlayers demonstrates the improved crystal quality of films grown epitaxially on IBAD MgO. The process simplifies the synthesis of IBAD MgO, fundamentally solves the “wrinkle” issue induced by the homoepitaxial layer on sub-50 nm membranes, and enables studies of epitaxial materials in electron/X-ray transmission and nanocalorimetry.

Authors:
; ; ; ; ;
Publication Date:
Research Org.:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES)
OSTI Identifier:
1337585
Alternate Identifier(s):
OSTI ID: 1331404; OSTI ID: 1372677
Report Number(s):
LBNL-1006527
Journal ID: ISSN 0003-6951; 10.1063/1.4966956
Grant/Contract Number:  
AC02-05CH11231
Resource Type:
Published Article
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Name: Applied Physics Letters Journal Volume: 109 Journal Issue: 19; Journal ID: ISSN 0003-6951
Publisher:
American Institute of Physics (AIP)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; Epitaxy; Ion beam assisted deposition; Thin film growth; Atomic force microscopy; X-ray diffraction

Citation Formats

Wang, Siming, Antonakos, C., Bordel, C., Bouma, D. S., Fischer, P., and Hellman, F. Ultrathin IBAD MgO films for epitaxial growth on amorphous substrates and sub-50 nm membranes. United States: N. p., 2016. Web. doi:10.1063/1.4966956.
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Wang, Siming, Antonakos, C., Bordel, C., Bouma, D. S., Fischer, P., & Hellman, F. Ultrathin IBAD MgO films for epitaxial growth on amorphous substrates and sub-50 nm membranes. United States. https://doi.org/10.1063/1.4966956
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Wang, Siming, Antonakos, C., Bordel, C., Bouma, D. S., Fischer, P., and Hellman, F. Mon . "Ultrathin IBAD MgO films for epitaxial growth on amorphous substrates and sub-50 nm membranes". United States. https://doi.org/10.1063/1.4966956.
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@article{osti_1337585,
title = {Ultrathin IBAD MgO films for epitaxial growth on amorphous substrates and sub-50 nm membranes},
author = {Wang, Siming and Antonakos, C. and Bordel, C. and Bouma, D. S. and Fischer, P. and Hellman, F.},
abstractNote = {Here, a fabrication process has been developed for high energy ion beam assisted deposition (IBAD) biaxial texturing of ultrathin (~1 nm) MgO films, using a high ion-to-atom ratio and post-deposition annealing instead of a homoepitaxial MgO layer. These films serve as the seed layer for epitaxial growth of materials on amorphous substrates such as electron/X-ray transparent membranes or nanocalorimetry devices. Stress measurements and atomic force microscopy of the MgO films reveal decreased stress and surface roughness, while X-ray diffraction of epitaxial overlayers demonstrates the improved crystal quality of films grown epitaxially on IBAD MgO. The process simplifies the synthesis of IBAD MgO, fundamentally solves the “wrinkle” issue induced by the homoepitaxial layer on sub-50 nm membranes, and enables studies of epitaxial materials in electron/X-ray transmission and nanocalorimetry.},
doi = {10.1063/1.4966956},
journal = {Applied Physics Letters},
number = 19,
volume = 109,
place = {United States},
year = {Mon Nov 07 00:00:00 EST 2016},
month = {Mon Nov 07 00:00:00 EST 2016}
}
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Journal Article:
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Publisher's Version of Record
https://doi.org/10.1063/1.4966956
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