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Title: Epitaxial growth and physical properties of ternary nitride thin films by polymer-assisted deposition

Epitaxial layered ternary metal-nitride FeMoN 2, (Fe 0.33 Mo 0.67)MoN 2, CoMoN 2, and FeWN 2 thin films have been grown on c-plane sapphire substrates by polymer-assisted deposition. The ABN 2 layer sits on top of the oxygen sublattices of the substrate with three possible matching configurations due to the significantly reduced lattice mismatch. The doping composition and elements affect not only the out-of-plane lattice parameters but also the temperature-dependent electrical properties. These films have resistivity in the range of 0.1–1 mΩ·cm, showing tunable metallic or semiconducting behaviors by adjusting the composition. A modified parallel connection channel model has been used to analyze the grain boundary and Coulomb blockade effect on the electrical properties. Furthermore, the growth of the high crystallinity layered epitaxial thin films provides an avenue to study the composition-structure-property relationship in ABN 2 materials through A and B-site substitution.
ORCiD logo [1] ;  [2] ; ORCiD logo [1] ;  [1] ;  [1] ;  [1] ;  [3] ;  [1] ;  [1] ;  [4] ;  [3] ;  [1]
  1. Los Alamos National Lab. (LANL), Los Alamos, NM (United States)
  2. Tsinghua Univ., Beijing (China)
  3. Univ. of Texas at San Antonio, San Antonio, TX (United States)
  4. Texas A & M Univ., College Station, TX (United States)
Publication Date:
Report Number(s):
Journal ID: ISSN 0003-6951; APPLAB
Grant/Contract Number:
Accepted Manuscript
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Volume: 109; Journal Issue: 8; Journal ID: ISSN 0003-6951
American Institute of Physics (AIP)
Research Org:
Los Alamos National Lab. (LANL), Los Alamos, NM (United States)
Sponsoring Org:
USDOE Laboratory Directed Research and Development (LDRD) Program
Country of Publication:
United States
36 MATERIALS SCIENCE; inorganic and physical chemistry; material science; thin film structure; molybdenum; epitaxy; electrical resistivity; materials properties
OSTI Identifier:
Alternate Identifier(s):
OSTI ID: 1307786