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Title: Damage-free laser patterning of silicon nitride on textured crystalline silicon using an amorphous silicon etch mask for Ni/Cu plated silicon solar cells

Authors:
; ; ; ;
Publication Date:
Type:
Publisher's Accepted Manuscript
Journal Name:
Thin Solid Films
Additional Journal Information:
Journal Volume: 612; Journal Issue: C; Related Information: CHORUS Timestamp: 2018-09-11 06:30:28; Journal ID: ISSN 0040-6090
Publisher:
Elsevier
Sponsoring Org:
USDOE
Country of Publication:
Netherlands
Language:
English
OSTI Identifier:
1328527

Bailly, Mark S., Karas, Joseph, Jain, Harsh, Dauksher, William J., and Bowden, Stuart. Damage-free laser patterning of silicon nitride on textured crystalline silicon using an amorphous silicon etch mask for Ni/Cu plated silicon solar cells. Netherlands: N. p., Web. doi:10.1016/j.tsf.2016.06.011.
Bailly, Mark S., Karas, Joseph, Jain, Harsh, Dauksher, William J., & Bowden, Stuart. Damage-free laser patterning of silicon nitride on textured crystalline silicon using an amorphous silicon etch mask for Ni/Cu plated silicon solar cells. Netherlands. doi:10.1016/j.tsf.2016.06.011.
Bailly, Mark S., Karas, Joseph, Jain, Harsh, Dauksher, William J., and Bowden, Stuart. 2016. "Damage-free laser patterning of silicon nitride on textured crystalline silicon using an amorphous silicon etch mask for Ni/Cu plated silicon solar cells". Netherlands. doi:10.1016/j.tsf.2016.06.011.
@article{osti_1328527,
title = {Damage-free laser patterning of silicon nitride on textured crystalline silicon using an amorphous silicon etch mask for Ni/Cu plated silicon solar cells},
author = {Bailly, Mark S. and Karas, Joseph and Jain, Harsh and Dauksher, William J. and Bowden, Stuart},
abstractNote = {},
doi = {10.1016/j.tsf.2016.06.011},
journal = {Thin Solid Films},
number = C,
volume = 612,
place = {Netherlands},
year = {2016},
month = {8}
}