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This content will become publicly available on June 16, 2017

Title: Damage-free laser patterning of silicon nitride on textured crystalline silicon using an amorphous silicon etch mask for Ni/Cu plated silicon solar cells

Authors:
; ; ; ;
Publication Date:
OSTI Identifier:
1328527
Type:
Publisher's Accepted Manuscript
Journal Name:
Thin Solid Films
Additional Journal Information:
Journal Volume: 612; Journal Issue: C; Related Information: CHORUS Timestamp: 2016-12-24 07:39:09; Journal ID: ISSN 0040-6090
Publisher:
Elsevier
Sponsoring Org:
USDOE Office of Energy Efficiency and Renewable Energy (EERE)
Country of Publication:
Netherlands
Language:
English