Atomic layer deposition—Sequential self-limiting surface reactions for advanced catalyst “bottom-up” synthesis

Lu, Junling; Elam, Jeffrey W.; Stair, Peter C.

doi:10.1016/j.surfrep.2016.03.003

Title: Atomic layer deposition—Sequential self-limiting surface reactions for advanced catalyst “bottom-up” synthesis

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Authors:: Lu, Junling; Elam, Jeffrey W.; Stair, Peter C.

Publication Date:: 2016-06-01

Sponsoring Org.:: USDOE Office of Science (SC), Basic Energy Sciences (BES)

OSTI Identifier:: 1326421

Resource Type:: Publisher's Accepted Manuscript

Journal Name:: Surface Science Reports

Additional Journal Information:: Journal Name: Surface Science Reports Journal Volume: 71 Journal Issue: 2; Journal ID: ISSN 0167-5729

Publisher:: Elsevier

Country of Publication:: Netherlands

Language:: English

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                    Lu, Junling, Elam, Jeffrey W., and Stair, Peter C.. Atomic layer deposition—Sequential self-limiting surface reactions for advanced catalyst “bottom-up” synthesis.  Netherlands: N. p., 2016. 
Web.  doi:10.1016/j.surfrep.2016.03.003.

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                    Lu, Junling, Elam, Jeffrey W., & Stair, Peter C.. Atomic layer deposition—Sequential self-limiting surface reactions for advanced catalyst “bottom-up” synthesis.  Netherlands.  https://doi.org/10.1016/j.surfrep.2016.03.003

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                    Lu, Junling, Elam, Jeffrey W., and Stair, Peter C.. Wed .  
"Atomic layer deposition—Sequential self-limiting surface reactions for advanced catalyst “bottom-up” synthesis".  Netherlands.  https://doi.org/10.1016/j.surfrep.2016.03.003.

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@article{osti_1326421,

  title        = {Atomic layer deposition—Sequential self-limiting surface reactions for advanced catalyst “bottom-up” synthesis},

  author       = {Lu, Junling and Elam, Jeffrey W. and Stair, Peter C.},

  abstractNote = {},

  doi          = {10.1016/j.surfrep.2016.03.003},

  journal      = {Surface Science Reports},

  number       = 2,

  volume       = 71,

  place        = {Netherlands},

  year         = {2016},

  month        = {6}

}

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