Atomic layer deposition—Sequential self-limiting surface reactions for advanced catalyst “bottom-up” synthesis
- Authors:
- Publication Date:
- Sponsoring Org.:
- USDOE Office of Science (SC), Basic Energy Sciences (BES)
- OSTI Identifier:
- 1326421
- Resource Type:
- Publisher's Accepted Manuscript
- Journal Name:
- Surface Science Reports
- Additional Journal Information:
- Journal Name: Surface Science Reports Journal Volume: 71 Journal Issue: 2; Journal ID: ISSN 0167-5729
- Publisher:
- Elsevier
- Country of Publication:
- Netherlands
- Language:
- English
Citation Formats
Lu, Junling, Elam, Jeffrey W., and Stair, Peter C.. Atomic layer deposition—Sequential self-limiting surface reactions for advanced catalyst “bottom-up” synthesis. Netherlands: N. p., 2016.
Web. doi:10.1016/j.surfrep.2016.03.003.
Lu, Junling, Elam, Jeffrey W., & Stair, Peter C.. Atomic layer deposition—Sequential self-limiting surface reactions for advanced catalyst “bottom-up” synthesis. Netherlands. https://doi.org/10.1016/j.surfrep.2016.03.003
Lu, Junling, Elam, Jeffrey W., and Stair, Peter C.. Wed .
"Atomic layer deposition—Sequential self-limiting surface reactions for advanced catalyst “bottom-up” synthesis". Netherlands. https://doi.org/10.1016/j.surfrep.2016.03.003.
@article{osti_1326421,
title = {Atomic layer deposition—Sequential self-limiting surface reactions for advanced catalyst “bottom-up” synthesis},
author = {Lu, Junling and Elam, Jeffrey W. and Stair, Peter C.},
abstractNote = {},
doi = {10.1016/j.surfrep.2016.03.003},
journal = {Surface Science Reports},
number = 2,
volume = 71,
place = {Netherlands},
year = {2016},
month = {6}
}
Free Publicly Available Full Text
Publisher's Version of Record
https://doi.org/10.1016/j.surfrep.2016.03.003
https://doi.org/10.1016/j.surfrep.2016.03.003
Other availability
Cited by: 197 works
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