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Title: Atomic layer deposition—Sequential self-limiting surface reactions for advanced catalyst “bottom-up” synthesis

Authors:
; ;
Publication Date:
Type:
Publisher's Accepted Manuscript
Journal Name:
Surface Science Reports
Additional Journal Information:
Journal Volume: 71; Journal Issue: 2; Related Information: CHORUS Timestamp: 2018-09-13 11:24:40; Journal ID: ISSN 0167-5729
Publisher:
Elsevier
Sponsoring Org:
USDOE
Country of Publication:
Netherlands
Language:
English
OSTI Identifier:
1326421

Lu, Junling, Elam, Jeffrey W., and Stair, Peter C.. Atomic layer deposition—Sequential self-limiting surface reactions for advanced catalyst “bottom-up” synthesis. Netherlands: N. p., Web. doi:10.1016/j.surfrep.2016.03.003.
Lu, Junling, Elam, Jeffrey W., & Stair, Peter C.. Atomic layer deposition—Sequential self-limiting surface reactions for advanced catalyst “bottom-up” synthesis. Netherlands. doi:10.1016/j.surfrep.2016.03.003.
Lu, Junling, Elam, Jeffrey W., and Stair, Peter C.. 2016. "Atomic layer deposition—Sequential self-limiting surface reactions for advanced catalyst “bottom-up” synthesis". Netherlands. doi:10.1016/j.surfrep.2016.03.003.
@article{osti_1326421,
title = {Atomic layer deposition—Sequential self-limiting surface reactions for advanced catalyst “bottom-up” synthesis},
author = {Lu, Junling and Elam, Jeffrey W. and Stair, Peter C.},
abstractNote = {},
doi = {10.1016/j.surfrep.2016.03.003},
journal = {Surface Science Reports},
number = 2,
volume = 71,
place = {Netherlands},
year = {2016},
month = {6}
}