4H–SiC homoepitaxy on nearly on-axis substrates using TFS-towards high quality epitaxial growth
- Authors:
- Publication Date:
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1324352
- Grant/Contract Number:
- 12-3834
- Resource Type:
- Publisher's Accepted Manuscript
- Journal Name:
- Journal of Crystal Growth
- Additional Journal Information:
- Journal Name: Journal of Crystal Growth Journal Volume: 448 Journal Issue: C; Journal ID: ISSN 0022-0248
- Publisher:
- Elsevier
- Country of Publication:
- Netherlands
- Language:
- English
Citation Formats
Balachandran, Anusha, Song, Haizheng, Sudarshan, T. S., and Chandrashekhar, M. V. S. 4H–SiC homoepitaxy on nearly on-axis substrates using TFS-towards high quality epitaxial growth. Netherlands: N. p., 2016.
Web. doi:10.1016/j.jcrysgro.2016.05.018.
Balachandran, Anusha, Song, Haizheng, Sudarshan, T. S., & Chandrashekhar, M. V. S. 4H–SiC homoepitaxy on nearly on-axis substrates using TFS-towards high quality epitaxial growth. Netherlands. https://doi.org/10.1016/j.jcrysgro.2016.05.018
Balachandran, Anusha, Song, Haizheng, Sudarshan, T. S., and Chandrashekhar, M. V. S. Mon .
"4H–SiC homoepitaxy on nearly on-axis substrates using TFS-towards high quality epitaxial growth". Netherlands. https://doi.org/10.1016/j.jcrysgro.2016.05.018.
@article{osti_1324352,
title = {4H–SiC homoepitaxy on nearly on-axis substrates using TFS-towards high quality epitaxial growth},
author = {Balachandran, Anusha and Song, Haizheng and Sudarshan, T. S. and Chandrashekhar, M. V. S.},
abstractNote = {},
doi = {10.1016/j.jcrysgro.2016.05.018},
journal = {Journal of Crystal Growth},
number = C,
volume = 448,
place = {Netherlands},
year = {Mon Aug 01 00:00:00 EDT 2016},
month = {Mon Aug 01 00:00:00 EDT 2016}
}
Free Publicly Available Full Text
Publisher's Version of Record
https://doi.org/10.1016/j.jcrysgro.2016.05.018
https://doi.org/10.1016/j.jcrysgro.2016.05.018
Other availability
Cited by: 10 works
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