Selective directed self-assembly of coexisting morphologies using block copolymer blends
Abstract
Directed self-assembly (DSA) of block copolymers is an emergent technique for nano-lithography, but is limited in the range of structures possible in a single fabrication step. We expand on traditional DSA chemical patterning. Moreover, a blend of lamellar- and cylinder-forming block copolymers assembles on specially designed surface chemical line gratings, leading to the simultaneous formation of coexisting ordered morphologies in separate areas of the substrate. The competing energetics of polymer chain distortions and chemical mismatch with the substrate grating bias the system towards either line/space or dot array patterns, depending on the pitch and linewidth of the prepattern. This contrasts with typical DSA, wherein assembly of a single-component block copolymer on chemical templates generates patterns of either lines/spaces (lamellar) or hexagonal dot arrays (cylinders). In our approach, the chemical template encodes desired local spatial arrangements of coexisting design motifs, self-assembled from a single, sophisticated resist.
- Authors:
-
- Brookhaven National Lab. (BNL), Upton, NY (United States)
- Publication Date:
- Research Org.:
- Brookhaven National Laboratory (BNL), Upton, NY (United States)
- Sponsoring Org.:
- USDOE Office of Science (SC), Basic Energy Sciences (BES)
- OSTI Identifier:
- 1303021
- Report Number(s):
- BNL-112517-2016-JA
Journal ID: ISSN 2041-1723; KC0403020
- Grant/Contract Number:
- SC00112704
- Resource Type:
- Accepted Manuscript
- Journal Name:
- Nature Communications
- Additional Journal Information:
- Journal Volume: 7; Journal ID: ISSN 2041-1723
- Publisher:
- Nature Publishing Group
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 77 NANOSCIENCE AND NANOTECHNOLOGY
Citation Formats
Stein, A., Wright, G., Yager, K. G., Doerk, G. S., and Black, C. T. Selective directed self-assembly of coexisting morphologies using block copolymer blends. United States: N. p., 2016.
Web. doi:10.1038/ncomms12366.
Stein, A., Wright, G., Yager, K. G., Doerk, G. S., & Black, C. T. Selective directed self-assembly of coexisting morphologies using block copolymer blends. United States. https://doi.org/10.1038/ncomms12366
Stein, A., Wright, G., Yager, K. G., Doerk, G. S., and Black, C. T. Tue .
"Selective directed self-assembly of coexisting morphologies using block copolymer blends". United States. https://doi.org/10.1038/ncomms12366. https://www.osti.gov/servlets/purl/1303021.
@article{osti_1303021,
title = {Selective directed self-assembly of coexisting morphologies using block copolymer blends},
author = {Stein, A. and Wright, G. and Yager, K. G. and Doerk, G. S. and Black, C. T.},
abstractNote = {Directed self-assembly (DSA) of block copolymers is an emergent technique for nano-lithography, but is limited in the range of structures possible in a single fabrication step. We expand on traditional DSA chemical patterning. Moreover, a blend of lamellar- and cylinder-forming block copolymers assembles on specially designed surface chemical line gratings, leading to the simultaneous formation of coexisting ordered morphologies in separate areas of the substrate. The competing energetics of polymer chain distortions and chemical mismatch with the substrate grating bias the system towards either line/space or dot array patterns, depending on the pitch and linewidth of the prepattern. This contrasts with typical DSA, wherein assembly of a single-component block copolymer on chemical templates generates patterns of either lines/spaces (lamellar) or hexagonal dot arrays (cylinders). In our approach, the chemical template encodes desired local spatial arrangements of coexisting design motifs, self-assembled from a single, sophisticated resist.},
doi = {10.1038/ncomms12366},
journal = {Nature Communications},
number = ,
volume = 7,
place = {United States},
year = {Tue Aug 02 00:00:00 EDT 2016},
month = {Tue Aug 02 00:00:00 EDT 2016}
}
Web of Science
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