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Title: High temperature Hall measurement setup for thin film characterization

Authors:
ORCiD logo [1];  [1]; ORCiD logo [1]
  1. Electrical and Computer Engineering, University of Connecticut, Storrs, Connecticut 06269, USA
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1272653
Grant/Contract Number:  
FG02-10ER46774; SC0005038
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Review of Scientific Instruments
Additional Journal Information:
Journal Name: Review of Scientific Instruments Journal Volume: 87 Journal Issue: 7; Journal ID: ISSN 0034-6748
Publisher:
American Institute of Physics
Country of Publication:
United States
Language:
English

Citation Formats

Adnane, L., Gokirmak, A., and Silva, H. High temperature Hall measurement setup for thin film characterization. United States: N. p., 2016. Web. doi:10.1063/1.4959222.
Adnane, L., Gokirmak, A., & Silva, H. High temperature Hall measurement setup for thin film characterization. United States. doi:10.1063/1.4959222.
Adnane, L., Gokirmak, A., and Silva, H. Tue . "High temperature Hall measurement setup for thin film characterization". United States. doi:10.1063/1.4959222.
@article{osti_1272653,
title = {High temperature Hall measurement setup for thin film characterization},
author = {Adnane, L. and Gokirmak, A. and Silva, H.},
abstractNote = {},
doi = {10.1063/1.4959222},
journal = {Review of Scientific Instruments},
number = 7,
volume = 87,
place = {United States},
year = {2016},
month = {7}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
DOI: 10.1063/1.4959222

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Works referenced in this record:

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