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Title: Large-Scale All-Dielectric Metamaterial Perfect Reflectors

All-dielectric metamaterials offer a potential low-loss alternative to plasmonic metamaterials at optical frequencies. In this paper, we take advantage of the low absorption loss as well as the simple unit cell geometry to demonstrate large-scale (centimeter-sized) all-dielectric metamaterial perfect reflectors made from silicon cylinder resonators. These perfect reflectors, operating in the telecommunications band, were fabricated using self-assembly based nanosphere lithography. In spite of the disorder originating from the self-assembly process, the average reflectance of the metamaterial perfect reflectors is 99.7% at 1530 nm, surpassing the reflectance of metallic mirrors. Moreover, the spectral separation of the electric and magnetic resonances can be chosen to achieve the required reflection bandwidth while maintaining a high tolerance to disorder. Finally, the scalability of this design could lead to new avenues of manipulating light for low-loss and large-area photonic applications.
 [1] ;  [2] ;  [3] ;  [4] ;  [4] ;  [2] ;  [3]
  1. Vanderbilt Univ., Nashville, TN (United States). Interdisciplinary Materials Science Program
  2. SRI International, Menlo Park, CA (United States). Applied Optics Lab.
  3. Vanderbilt Univ., Nashville, TN (United States). Dept. of Mechanical Engineering
  4. Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences
Publication Date:
Grant/Contract Number:
AC05-00OR22725; N00014-14-1-0475; N00014-12-1-0722
Accepted Manuscript
Journal Name:
ACS Photonics
Additional Journal Information:
Journal Volume: 2; Journal Issue: 6; Journal ID: ISSN 2330-4022
American Chemical Society (ACS)
Research Org:
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)
Sponsoring Org:
USDOE Office of Science (SC); US Department of the Navy, Office of Naval Research (ONR)
Contributing Orgs:
Vanderbilt Univ., Nashville, TN (United States); SRI International, Menlo Park, CA (United States)
Country of Publication:
United States
36 MATERIALS SCIENCE; all-dielectric metamaterial; Mie resonance; nanosphere lithography; perfect reflector
OSTI Identifier: