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Title: Amorphization resistance of nano-engineered SiC under heavy ion irradiation

Silicon carbide (SiC) with a high-density of planar defects (hereafter, ‘nano-engineered SiC’) and epitaxially-grown single-crystalline 3C-SiC were simultaneously irradiated with Au ions at room temperature, in order to compare their relative resistance to radiation-induced amorphization. Furthermore, it was found that the local threshold dose for amorphization is comparable for both samples under 2 MeV Au ion irradiation; whereas, nano-engineered SiC exhibits slightly greater radiation tolerance than single crystalline SiC under 10 MeV Au irradiation. Under 10 MeV Au ion irradiation, the dose for amorphization increased by about a factor of two in both nano-engineered and single crystal SiC due to the local increase in electronic energy loss that enhanced dynamic recovery.
Authors:
 [1] ;  [1] ;  [2] ;  [3] ;  [4] ;  [3]
  1. Kyushu Institute of Technology, Fukuoka (Japan)
  2. Univ. of Tennessee, Knoxville, TN (United States)
  3. Univ. of Tennessee, Knoxville, TN (United States); Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
  4. North Carolina State Univ., Raleigh, NC (United States)
Publication Date:
Grant/Contract Number:
AC05-00OR22725
Type:
Accepted Manuscript
Journal Name:
Journal of Nuclear Materials
Additional Journal Information:
Journal Volume: 478; Journal ID: ISSN 0022-3115
Publisher:
Elsevier
Research Org:
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
Sponsoring Org:
USDOE Office of Science (SC)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; SiC; amorphization; nanostructured materials; carbides; scanning/transmission electron microscopy (STEM)
OSTI Identifier:
1261569
Alternate Identifier(s):
OSTI ID: 1325327

Imada, Kenta, Ishimaru, Manabu, Xue, Haizhou, Zhang, Yanwen, Shannon, Steven C., and Weber, William J.. Amorphization resistance of nano-engineered SiC under heavy ion irradiation. United States: N. p., Web. doi:10.1016/j.jnucmat.2016.06.031.
Imada, Kenta, Ishimaru, Manabu, Xue, Haizhou, Zhang, Yanwen, Shannon, Steven C., & Weber, William J.. Amorphization resistance of nano-engineered SiC under heavy ion irradiation. United States. doi:10.1016/j.jnucmat.2016.06.031.
Imada, Kenta, Ishimaru, Manabu, Xue, Haizhou, Zhang, Yanwen, Shannon, Steven C., and Weber, William J.. 2016. "Amorphization resistance of nano-engineered SiC under heavy ion irradiation". United States. doi:10.1016/j.jnucmat.2016.06.031. https://www.osti.gov/servlets/purl/1261569.
@article{osti_1261569,
title = {Amorphization resistance of nano-engineered SiC under heavy ion irradiation},
author = {Imada, Kenta and Ishimaru, Manabu and Xue, Haizhou and Zhang, Yanwen and Shannon, Steven C. and Weber, William J.},
abstractNote = {Silicon carbide (SiC) with a high-density of planar defects (hereafter, ‘nano-engineered SiC’) and epitaxially-grown single-crystalline 3C-SiC were simultaneously irradiated with Au ions at room temperature, in order to compare their relative resistance to radiation-induced amorphization. Furthermore, it was found that the local threshold dose for amorphization is comparable for both samples under 2 MeV Au ion irradiation; whereas, nano-engineered SiC exhibits slightly greater radiation tolerance than single crystalline SiC under 10 MeV Au irradiation. Under 10 MeV Au ion irradiation, the dose for amorphization increased by about a factor of two in both nano-engineered and single crystal SiC due to the local increase in electronic energy loss that enhanced dynamic recovery.},
doi = {10.1016/j.jnucmat.2016.06.031},
journal = {Journal of Nuclear Materials},
number = ,
volume = 478,
place = {United States},
year = {2016},
month = {6}
}