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This content will become publicly available on July 1, 2017

Title: Fluorocarbon based atomic layer etching of Si 3 N 4 and etching selectivity of SiO 2 over Si 3 N 4

Authors:
; ; ; ;
Publication Date:
OSTI Identifier:
1260000
Grant/Contract Number:
SC0001939
Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
Additional Journal Information:
Journal Volume: 34; Journal Issue: 4; Related Information: CHORUS Timestamp: 2016-12-27 20:25:07; Journal ID: ISSN 0734-2101
Publisher:
American Vacuum Society
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English