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Title: Impedance of an intense plasma-cathode electron source for tokamak startup

In this study, an impedance model is formulated and tested for the ~1kV, ~1kA/cm 2, arc-plasma cathode electron source used for local helicity injection tokamak startup. A double layer sheath is established between the high-density arc plasma (n arc ≈ 10 21 m -3) within the electron source, and the less dense external tokamak edge plasma (n edge ≈ 10 18 m -3) into which current is injected at the applied injector voltage, V inj. Experiments on the Pegasus spherical tokamak show the injected current, I inj, increases with V inj according to the standard double layer scaling I inj ~ V inj 3/2 at low current and transitions to I inj ~ V inj 1/2 at high currents. In this high current regime, sheath expansion and/or space charge neutralization impose limits on the beam density n b ~ I inj/V inj 1/2. For low tokamak edge density n edge and high I inj, the inferred beam density n b is consistent with the requirement n b ≤ n edge imposed by space-charge neutralization of the beam in the tokamak edge plasma. At sufficient edge density, n b ~ n arc is observed, consistent with a limit to n bmore » imposed by expansion of the double layer sheath. These results suggest that n arc is a viable control actuator for the source impedance.« less
Authors:
ORCiD logo [1] ; ORCiD logo [1] ; ORCiD logo [1] ; ORCiD logo [1] ; ORCiD logo [1] ; ORCiD logo [1]
  1. Univ. of Wisconsin-Madison, Madison, WI (United States)
Publication Date:
Grant/Contract Number:
FG02-96ER54375
Type:
Accepted Manuscript
Journal Name:
Physics of Plasmas
Additional Journal Information:
Journal Volume: 23; Journal Issue: 5; Journal ID: ISSN 1070-664X
Publisher:
American Institute of Physics (AIP)
Research Org:
Univ. of Wisconsin-Madison, Madison, WI (United States)
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; tokamaks; double layer; helicity injection; plasma cathode; electron source; plasma source; plasma sheaths; cathodes; charge injection
OSTI Identifier:
1255444
Alternate Identifier(s):
OSTI ID: 1255165