Concurrent atomistic–continuum simulations of dislocation–void interactions in fcc crystals
- Authors:
- Publication Date:
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1252304
- Grant/Contract Number:
- DOE/DE-SC0006539
- Resource Type:
- Publisher's Accepted Manuscript
- Journal Name:
- International Journal of Plasticity
- Additional Journal Information:
- Journal Name: International Journal of Plasticity Journal Volume: 65 Journal Issue: C; Journal ID: ISSN 0749-6419
- Publisher:
- Elsevier
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Xiong, Liming, Xu, Shuozhi, McDowell, David L., and Chen, Youping. Concurrent atomistic–continuum simulations of dislocation–void interactions in fcc crystals. United States: N. p., 2015.
Web. doi:10.1016/j.ijplas.2014.08.002.
Xiong, Liming, Xu, Shuozhi, McDowell, David L., & Chen, Youping. Concurrent atomistic–continuum simulations of dislocation–void interactions in fcc crystals. United States. https://doi.org/10.1016/j.ijplas.2014.08.002
Xiong, Liming, Xu, Shuozhi, McDowell, David L., and Chen, Youping. Sun .
"Concurrent atomistic–continuum simulations of dislocation–void interactions in fcc crystals". United States. https://doi.org/10.1016/j.ijplas.2014.08.002.
@article{osti_1252304,
title = {Concurrent atomistic–continuum simulations of dislocation–void interactions in fcc crystals},
author = {Xiong, Liming and Xu, Shuozhi and McDowell, David L. and Chen, Youping},
abstractNote = {},
doi = {10.1016/j.ijplas.2014.08.002},
journal = {International Journal of Plasticity},
number = C,
volume = 65,
place = {United States},
year = {Sun Feb 01 00:00:00 EST 2015},
month = {Sun Feb 01 00:00:00 EST 2015}
}
Free Publicly Available Full Text
Publisher's Version of Record
https://doi.org/10.1016/j.ijplas.2014.08.002
https://doi.org/10.1016/j.ijplas.2014.08.002
Other availability
Cited by: 71 works
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