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Title: Silicon nanomembranes as a means to evaluate stress evolution in deposited thin films

Authors:
; ; ; ; ; ; ;
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1250230
Alternate Identifier(s):
OSTI ID: 1556409
Grant/Contract Number:  
FG02-03ER46028
Resource Type:
Published Article
Journal Name:
Extreme Mechanics Letters
Additional Journal Information:
Journal Volume: 1; Journal Issue: C; Journal ID: ISSN 2352-4316
Publisher:
Elsevier
Country of Publication:
Netherlands
Language:
English

Citation Formats

Clausen, Anna M., Paskiewicz, Deborah M., Sadeghirad, Alireza, Jakes, Joseph, Savage, Donald E., Stone, Donald S., Liu, Feng, and Lagally, Max G. Silicon nanomembranes as a means to evaluate stress evolution in deposited thin films. Netherlands: N. p., 2014. Web. doi:10.1016/j.eml.2014.12.003.
Clausen, Anna M., Paskiewicz, Deborah M., Sadeghirad, Alireza, Jakes, Joseph, Savage, Donald E., Stone, Donald S., Liu, Feng, & Lagally, Max G. Silicon nanomembranes as a means to evaluate stress evolution in deposited thin films. Netherlands. https://doi.org/10.1016/j.eml.2014.12.003
Clausen, Anna M., Paskiewicz, Deborah M., Sadeghirad, Alireza, Jakes, Joseph, Savage, Donald E., Stone, Donald S., Liu, Feng, and Lagally, Max G. Mon . "Silicon nanomembranes as a means to evaluate stress evolution in deposited thin films". Netherlands. https://doi.org/10.1016/j.eml.2014.12.003.
@article{osti_1250230,
title = {Silicon nanomembranes as a means to evaluate stress evolution in deposited thin films},
author = {Clausen, Anna M. and Paskiewicz, Deborah M. and Sadeghirad, Alireza and Jakes, Joseph and Savage, Donald E. and Stone, Donald S. and Liu, Feng and Lagally, Max G.},
abstractNote = {},
doi = {10.1016/j.eml.2014.12.003},
journal = {Extreme Mechanics Letters},
number = C,
volume = 1,
place = {Netherlands},
year = {Mon Dec 01 00:00:00 EST 2014},
month = {Mon Dec 01 00:00:00 EST 2014}
}