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Title: Model form uncertainty versus intrinsic atomic variability in amorphous silicon oxides and nitrides

Authors:
; ;
Publication Date:
Type:
Publisher's Accepted Manuscript
Journal Name:
Computational Materials Science
Additional Journal Information:
Journal Volume: 109; Journal Issue: C; Related Information: CHORUS Timestamp: 2018-09-20 15:56:07; Journal ID: ISSN 0927-0256
Publisher:
Elsevier
Sponsoring Org:
USDOE
Country of Publication:
Netherlands
Language:
English
OSTI Identifier:
1250130

Anderson, Nathan L., Vedula, Ravi Pramod, and Strachan, Alejandro. Model form uncertainty versus intrinsic atomic variability in amorphous silicon oxides and nitrides. Netherlands: N. p., Web. doi:10.1016/j.commatsci.2015.06.014.
Anderson, Nathan L., Vedula, Ravi Pramod, & Strachan, Alejandro. Model form uncertainty versus intrinsic atomic variability in amorphous silicon oxides and nitrides. Netherlands. doi:10.1016/j.commatsci.2015.06.014.
Anderson, Nathan L., Vedula, Ravi Pramod, and Strachan, Alejandro. 2015. "Model form uncertainty versus intrinsic atomic variability in amorphous silicon oxides and nitrides". Netherlands. doi:10.1016/j.commatsci.2015.06.014.
@article{osti_1250130,
title = {Model form uncertainty versus intrinsic atomic variability in amorphous silicon oxides and nitrides},
author = {Anderson, Nathan L. and Vedula, Ravi Pramod and Strachan, Alejandro},
abstractNote = {},
doi = {10.1016/j.commatsci.2015.06.014},
journal = {Computational Materials Science},
number = C,
volume = 109,
place = {Netherlands},
year = {2015},
month = {11}
}