skip to main content
DOE PAGES title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Model form uncertainty versus intrinsic atomic variability in amorphous silicon oxides and nitrides

Authors:
; ;
Publication Date:
Sponsoring Org.:
USDOE National Nuclear Security Administration (NNSA)
OSTI Identifier:
1250130
Grant/Contract Number:  
FC52-08NA28617
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Computational Materials Science
Additional Journal Information:
Journal Name: Computational Materials Science Journal Volume: 109 Journal Issue: C; Journal ID: ISSN 0927-0256
Publisher:
Elsevier
Country of Publication:
Netherlands
Language:
English

Citation Formats

Anderson, Nathan L., Vedula, Ravi Pramod, and Strachan, Alejandro. Model form uncertainty versus intrinsic atomic variability in amorphous silicon oxides and nitrides. Netherlands: N. p., 2015. Web. doi:10.1016/j.commatsci.2015.06.014.
Anderson, Nathan L., Vedula, Ravi Pramod, & Strachan, Alejandro. Model form uncertainty versus intrinsic atomic variability in amorphous silicon oxides and nitrides. Netherlands. doi:10.1016/j.commatsci.2015.06.014.
Anderson, Nathan L., Vedula, Ravi Pramod, and Strachan, Alejandro. Sun . "Model form uncertainty versus intrinsic atomic variability in amorphous silicon oxides and nitrides". Netherlands. doi:10.1016/j.commatsci.2015.06.014.
@article{osti_1250130,
title = {Model form uncertainty versus intrinsic atomic variability in amorphous silicon oxides and nitrides},
author = {Anderson, Nathan L. and Vedula, Ravi Pramod and Strachan, Alejandro},
abstractNote = {},
doi = {10.1016/j.commatsci.2015.06.014},
journal = {Computational Materials Science},
number = C,
volume = 109,
place = {Netherlands},
year = {2015},
month = {11}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
DOI: 10.1016/j.commatsci.2015.06.014

Save / Share: