Impact of low-dose electron irradiation on $$n^{+}p$$ silicon strip sensors
Abstract
The response of n+p silicon strip sensors to electrons from a 90Sr source was measured using a multi-channel read-out system with 25 ns sampling time. The measurements were performed over a period of several weeks, during which the operating conditions were varied. The sensors were fabricated by Hamamatsu Photonics on 200 μm thick float-zone and magnetic-Czochralski silicon. Their pitch was 80 μm, and both p-stop and p-spray isolation of the n+ strips were studied. The electrons from the 90Sr source were collimated to a spot with a full-width-at-half-maximum of 2 mm at the sensor surface, and the dose rate in the SiO2 at the maximum was about 50 Gy(SiO2)/d. After only a few hours of making measurements, significant changes in charge collection and charge sharing were observed. Annealing studies, with temperatures up to 80 °C and annealing times of 18 h showed that the changes can only be partially annealed. The observations can be qualitatively explained by the increase of the positive oxide-charge density due to the ionization of the SiO2 by the radiation from the β source. TCAD simulations of the electric field in the sensor for different oxide-charge densities and different boundary conditions at the sensor surface supportmore »
- Authors:
-
- Institut fur Hochenergiephysik der Osterreichischen Akademie der Wissenschaften (HEPHY), Vienna (Austria). et al.
- Publication Date:
- Research Org.:
- Fermi National Accelerator Laboratory (FNAL), Batavia, IL (United States)
- Sponsoring Org.:
- USDOE Office of Science (SC), High Energy Physics (HEP)
- Contributing Org.:
- CMS Collaboration
- OSTI Identifier:
- 1248040
- Report Number(s):
- FERMILAB-PUB-15-612-CMS
Journal ID: ISSN 0168-9002; 1396014
- Grant/Contract Number:
- AC02-07CH11359
- Resource Type:
- Accepted Manuscript
- Journal Name:
- Nuclear Instruments and Methods in Physics Research. Section A, Accelerators, Spectrometers, Detectors and Associated Equipment
- Additional Journal Information:
- Journal Volume: 803; Journal Issue: C; Journal ID: ISSN 0168-9002
- Publisher:
- Elsevier
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; silicon strip sensors; charge collection; radiation damage; surface damage
Citation Formats
Adam, W. Impact of low-dose electron irradiation on $n^{+}p$ silicon strip sensors. United States: N. p., 2015.
Web. doi:10.1016/j.nima.2015.08.026.
Adam, W. Impact of low-dose electron irradiation on $n^{+}p$ silicon strip sensors. United States. https://doi.org/10.1016/j.nima.2015.08.026
Adam, W. Fri .
"Impact of low-dose electron irradiation on $n^{+}p$ silicon strip sensors". United States. https://doi.org/10.1016/j.nima.2015.08.026. https://www.osti.gov/servlets/purl/1248040.
@article{osti_1248040,
title = {Impact of low-dose electron irradiation on $n^{+}p$ silicon strip sensors},
author = {Adam, W.},
abstractNote = {The response of n+p silicon strip sensors to electrons from a 90Sr source was measured using a multi-channel read-out system with 25 ns sampling time. The measurements were performed over a period of several weeks, during which the operating conditions were varied. The sensors were fabricated by Hamamatsu Photonics on 200 μm thick float-zone and magnetic-Czochralski silicon. Their pitch was 80 μm, and both p-stop and p-spray isolation of the n+ strips were studied. The electrons from the 90Sr source were collimated to a spot with a full-width-at-half-maximum of 2 mm at the sensor surface, and the dose rate in the SiO2 at the maximum was about 50 Gy(SiO2)/d. After only a few hours of making measurements, significant changes in charge collection and charge sharing were observed. Annealing studies, with temperatures up to 80 °C and annealing times of 18 h showed that the changes can only be partially annealed. The observations can be qualitatively explained by the increase of the positive oxide-charge density due to the ionization of the SiO2 by the radiation from the β source. TCAD simulations of the electric field in the sensor for different oxide-charge densities and different boundary conditions at the sensor surface support this explanation. As a result, the relevance of the measurements for the design of n+p strip sensors is discussed.},
doi = {10.1016/j.nima.2015.08.026},
journal = {Nuclear Instruments and Methods in Physics Research. Section A, Accelerators, Spectrometers, Detectors and Associated Equipment},
number = C,
volume = 803,
place = {United States},
year = {Fri Aug 28 00:00:00 EDT 2015},
month = {Fri Aug 28 00:00:00 EDT 2015}
}
Web of Science
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