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Title: Impact of low-dose electron irradiation on $$n^{+}p$$ silicon strip sensors

Abstract

The response of n+p silicon strip sensors to electrons from a 90Sr source was measured using a multi-channel read-out system with 25 ns sampling time. The measurements were performed over a period of several weeks, during which the operating conditions were varied. The sensors were fabricated by Hamamatsu Photonics on 200 μm thick float-zone and magnetic-Czochralski silicon. Their pitch was 80 μm, and both p-stop and p-spray isolation of the n+ strips were studied. The electrons from the 90Sr source were collimated to a spot with a full-width-at-half-maximum of 2 mm at the sensor surface, and the dose rate in the SiO2 at the maximum was about 50 Gy(SiO2)/d. After only a few hours of making measurements, significant changes in charge collection and charge sharing were observed. Annealing studies, with temperatures up to 80 °C and annealing times of 18 h showed that the changes can only be partially annealed. The observations can be qualitatively explained by the increase of the positive oxide-charge density due to the ionization of the SiO2 by the radiation from the β source. TCAD simulations of the electric field in the sensor for different oxide-charge densities and different boundary conditions at the sensor surface supportmore » this explanation. As a result, the relevance of the measurements for the design of n+p strip sensors is discussed.« less

Authors:
 [1]
  1. Institut fur Hochenergiephysik der Osterreichischen Akademie der Wissenschaften (HEPHY), Vienna (Austria). et al.
Publication Date:
Research Org.:
Fermi National Accelerator Laboratory (FNAL), Batavia, IL (United States)
Sponsoring Org.:
USDOE Office of Science (SC), High Energy Physics (HEP)
Contributing Org.:
CMS Collaboration
OSTI Identifier:
1248040
Report Number(s):
FERMILAB-PUB-15-612-CMS
Journal ID: ISSN 0168-9002; 1396014
Grant/Contract Number:  
AC02-07CH11359
Resource Type:
Accepted Manuscript
Journal Name:
Nuclear Instruments and Methods in Physics Research. Section A, Accelerators, Spectrometers, Detectors and Associated Equipment
Additional Journal Information:
Journal Volume: 803; Journal Issue: C; Journal ID: ISSN 0168-9002
Publisher:
Elsevier
Country of Publication:
United States
Language:
English
Subject:
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; silicon strip sensors; charge collection; radiation damage; surface damage

Citation Formats

Adam, W. Impact of low-dose electron irradiation on $n^{+}p$ silicon strip sensors. United States: N. p., 2015. Web. doi:10.1016/j.nima.2015.08.026.
Adam, W. Impact of low-dose electron irradiation on $n^{+}p$ silicon strip sensors. United States. https://doi.org/10.1016/j.nima.2015.08.026
Adam, W. Fri . "Impact of low-dose electron irradiation on $n^{+}p$ silicon strip sensors". United States. https://doi.org/10.1016/j.nima.2015.08.026. https://www.osti.gov/servlets/purl/1248040.
@article{osti_1248040,
title = {Impact of low-dose electron irradiation on $n^{+}p$ silicon strip sensors},
author = {Adam, W.},
abstractNote = {The response of n+p silicon strip sensors to electrons from a 90Sr source was measured using a multi-channel read-out system with 25 ns sampling time. The measurements were performed over a period of several weeks, during which the operating conditions were varied. The sensors were fabricated by Hamamatsu Photonics on 200 μm thick float-zone and magnetic-Czochralski silicon. Their pitch was 80 μm, and both p-stop and p-spray isolation of the n+ strips were studied. The electrons from the 90Sr source were collimated to a spot with a full-width-at-half-maximum of 2 mm at the sensor surface, and the dose rate in the SiO2 at the maximum was about 50 Gy(SiO2)/d. After only a few hours of making measurements, significant changes in charge collection and charge sharing were observed. Annealing studies, with temperatures up to 80 °C and annealing times of 18 h showed that the changes can only be partially annealed. The observations can be qualitatively explained by the increase of the positive oxide-charge density due to the ionization of the SiO2 by the radiation from the β source. TCAD simulations of the electric field in the sensor for different oxide-charge densities and different boundary conditions at the sensor surface support this explanation. As a result, the relevance of the measurements for the design of n+p strip sensors is discussed.},
doi = {10.1016/j.nima.2015.08.026},
journal = {Nuclear Instruments and Methods in Physics Research. Section A, Accelerators, Spectrometers, Detectors and Associated Equipment},
number = C,
volume = 803,
place = {United States},
year = {Fri Aug 28 00:00:00 EDT 2015},
month = {Fri Aug 28 00:00:00 EDT 2015}
}

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Works referencing / citing this record:

Characterisation of irradiated thin silicon sensors for the CMS phase II pixel upgrade
journal, August 2017


Characterisation of irradiated thin silicon sensors for the CMS phase II pixel upgrade
text, January 2017


Characterisation of irradiated thin silicon sensors for the CMS phase II pixel upgrade
text, January 2017