Evidence for breathing modes in direct current, pulsed, and high power impulse magnetron sputtering plasmas
- Authors:
-
[1]
; [2]
; [3]
; [4]
- State Key Lab for Materials Processing and Die & Mold Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, China, Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720, USA
- Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720, USA, Department of Electrical Engineering, Harbin Institute of Technology, Harbin 150000, China
- Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720, USA, Department of Physics, University of California, Berkeley, Berkeley, California 94720, USA
- Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720, USA
- Publication Date:
- Grant/Contract Number:
- AC02-05CH11231
- Type:
- Publisher's Accepted Manuscript
- Journal Name:
- Applied Physics Letters
- Additional Journal Information:
- Journal Name: Applied Physics Letters Journal Volume: 108 Journal Issue: 3; Journal ID: ISSN 0003-6951
- Publisher:
- American Institute of Physics
- Sponsoring Org:
- USDOE
- Country of Publication:
- United States
- Language:
- English
- OSTI Identifier:
- 1235378
Yang, Yuchen, Zhou, Xue, Liu, Jason X., and Anders, André. Evidence for breathing modes in direct current, pulsed, and high power impulse magnetron sputtering plasmas. United States: N. p.,
Web. doi:10.1063/1.4939922.
Yang, Yuchen, Zhou, Xue, Liu, Jason X., & Anders, André. Evidence for breathing modes in direct current, pulsed, and high power impulse magnetron sputtering plasmas. United States. doi:10.1063/1.4939922.
Yang, Yuchen, Zhou, Xue, Liu, Jason X., and Anders, André. 2016.
"Evidence for breathing modes in direct current, pulsed, and high power impulse magnetron sputtering plasmas". United States.
doi:10.1063/1.4939922.
@article{osti_1235378,
title = {Evidence for breathing modes in direct current, pulsed, and high power impulse magnetron sputtering plasmas},
author = {Yang, Yuchen and Zhou, Xue and Liu, Jason X. and Anders, André},
abstractNote = {},
doi = {10.1063/1.4939922},
journal = {Applied Physics Letters},
number = 3,
volume = 108,
place = {United States},
year = {2016},
month = {1}
}