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Title: Evidence for breathing modes in direct current, pulsed, and high power impulse magnetron sputtering plasmas

Authors:
ORCiD logo [1] ;  [2] ;  [3] ; ORCiD logo [4]
  1. State Key Lab for Materials Processing and Die & Mold Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, China, Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720, USA
  2. Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720, USA, Department of Electrical Engineering, Harbin Institute of Technology, Harbin 150000, China
  3. Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720, USA, Department of Physics, University of California, Berkeley, Berkeley, California 94720, USA
  4. Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720, USA
Publication Date:
Grant/Contract Number:
AC02-05CH11231
Type:
Publisher's Accepted Manuscript
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Name: Applied Physics Letters Journal Volume: 108 Journal Issue: 3; Journal ID: ISSN 0003-6951
Publisher:
American Institute of Physics
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
OSTI Identifier:
1235378

Yang, Yuchen, Zhou, Xue, Liu, Jason X., and Anders, André. Evidence for breathing modes in direct current, pulsed, and high power impulse magnetron sputtering plasmas. United States: N. p., Web. doi:10.1063/1.4939922.
Yang, Yuchen, Zhou, Xue, Liu, Jason X., & Anders, André. Evidence for breathing modes in direct current, pulsed, and high power impulse magnetron sputtering plasmas. United States. doi:10.1063/1.4939922.
Yang, Yuchen, Zhou, Xue, Liu, Jason X., and Anders, André. 2016. "Evidence for breathing modes in direct current, pulsed, and high power impulse magnetron sputtering plasmas". United States. doi:10.1063/1.4939922.
@article{osti_1235378,
title = {Evidence for breathing modes in direct current, pulsed, and high power impulse magnetron sputtering plasmas},
author = {Yang, Yuchen and Zhou, Xue and Liu, Jason X. and Anders, André},
abstractNote = {},
doi = {10.1063/1.4939922},
journal = {Applied Physics Letters},
number = 3,
volume = 108,
place = {United States},
year = {2016},
month = {1}
}