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Title: The impact of plasma dynamics on the self-magnetic-pinch diode impedance

In this study, the self-magnetic-pinch diode is being developed as an intense electron beam source for pulsed-power-driven x-ray radiography. The basic operation of this diode has long been understood in the context of pinched diodes, including the dynamic effect that the diode impedance decreases during the pulse due to electrode plasma formation and expansion. Experiments being conducted at Sandia National Laboratories' RITS-6 accelerator are helping to characterize these plasmas using time-resolved and time-integrated camera systems in the x-ray and visible. These diagnostics are analyzed in conjunction with particle-in-cell simulations of anode plasma formation and evolution. The results confirm the long-standing theory of critical-current operation with the addition of a time-dependent anode-cathode gap length. Finally, the results may suggest that anomalous impedance collapse is driven by increased plasma radial drift, leading to larger-than-average ion v r × B θ acceleration into the gap.
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  1. National Security Technologies, LLC, Las Vegas, NV (United States)
  2. Voss Scientific, LLC, Albuquerque, NM (United States)
  3. Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Publication Date:
Report Number(s):
SAND-2015-0768J; DOE/NV/25946-2277
Journal ID: ISSN 1070-664X; PHPAEN; 562632
Grant/Contract Number:
AC04-94AL85000; AC52-06NA25946
Accepted Manuscript
Journal Name:
Physics of Plasmas
Additional Journal Information:
Journal Volume: 22; Journal Issue: 3; Journal ID: ISSN 1070-664X
American Institute of Physics (AIP)
Research Org:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States); National Security Technologies, LLC. (NSTec), Las Vegas, NV (United States)
Sponsoring Org:
USDOE National Nuclear Security Administration (NNSA), Office of Defense Science (NA-113); Sandia National Lab. (United States)
Contributing Orgs:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Country of Publication:
United States
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; anodes; cathodes; plasma diagnostics; contaminants; plasma expansion
OSTI Identifier:
Alternate Identifier(s):
OSTI ID: 1228566; OSTI ID: 1242535