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Title: Thermal Resistance of Transferred-Silicon-Nanomembrane Interfaces

Authors:
; ; ; ; ;
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1229784
Grant/Contract Number:  
FG02-03ER46028; FG02-08ER46547
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Physical Review Letters
Additional Journal Information:
Journal Name: Physical Review Letters Journal Volume: 115 Journal Issue: 25; Journal ID: ISSN 0031-9007
Publisher:
American Physical Society
Country of Publication:
United States
Language:
English

Citation Formats

Schroeder, D. P., Aksamija, Z., Rath, A., Voyles, P. M., Lagally, M. G., and Eriksson, M. A. Thermal Resistance of Transferred-Silicon-Nanomembrane Interfaces. United States: N. p., 2015. Web. doi:10.1103/PhysRevLett.115.256101.
Schroeder, D. P., Aksamija, Z., Rath, A., Voyles, P. M., Lagally, M. G., & Eriksson, M. A. Thermal Resistance of Transferred-Silicon-Nanomembrane Interfaces. United States. https://doi.org/10.1103/PhysRevLett.115.256101
Schroeder, D. P., Aksamija, Z., Rath, A., Voyles, P. M., Lagally, M. G., and Eriksson, M. A. Tue . "Thermal Resistance of Transferred-Silicon-Nanomembrane Interfaces". United States. https://doi.org/10.1103/PhysRevLett.115.256101.
@article{osti_1229784,
title = {Thermal Resistance of Transferred-Silicon-Nanomembrane Interfaces},
author = {Schroeder, D. P. and Aksamija, Z. and Rath, A. and Voyles, P. M. and Lagally, M. G. and Eriksson, M. A.},
abstractNote = {},
doi = {10.1103/PhysRevLett.115.256101},
journal = {Physical Review Letters},
number = 25,
volume = 115,
place = {United States},
year = {Tue Dec 15 00:00:00 EST 2015},
month = {Tue Dec 15 00:00:00 EST 2015}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
https://doi.org/10.1103/PhysRevLett.115.256101

Citation Metrics:
Cited by: 26 works
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