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Title: Thermal Resistance of Transferred-Silicon-Nanomembrane Interfaces

Authors:
; ; ; ; ;
Publication Date:
Grant/Contract Number:
FG02-03ER46028; FG02-08ER46547
Type:
Publisher's Accepted Manuscript
Journal Name:
Physical Review Letters
Additional Journal Information:
Journal Name: Physical Review Letters Journal Volume: 115 Journal Issue: 25; Journal ID: ISSN 0031-9007
Publisher:
American Physical Society
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
OSTI Identifier:
1229784

Schroeder, D. P., Aksamija, Z., Rath, A., Voyles, P. M., Lagally, M. G., and Eriksson, M. A.. Thermal Resistance of Transferred-Silicon-Nanomembrane Interfaces. United States: N. p., Web. doi:10.1103/PhysRevLett.115.256101.
Schroeder, D. P., Aksamija, Z., Rath, A., Voyles, P. M., Lagally, M. G., & Eriksson, M. A.. Thermal Resistance of Transferred-Silicon-Nanomembrane Interfaces. United States. doi:10.1103/PhysRevLett.115.256101.
Schroeder, D. P., Aksamija, Z., Rath, A., Voyles, P. M., Lagally, M. G., and Eriksson, M. A.. 2015. "Thermal Resistance of Transferred-Silicon-Nanomembrane Interfaces". United States. doi:10.1103/PhysRevLett.115.256101.
@article{osti_1229784,
title = {Thermal Resistance of Transferred-Silicon-Nanomembrane Interfaces},
author = {Schroeder, D. P. and Aksamija, Z. and Rath, A. and Voyles, P. M. and Lagally, M. G. and Eriksson, M. A.},
abstractNote = {},
doi = {10.1103/PhysRevLett.115.256101},
journal = {Physical Review Letters},
number = 25,
volume = 115,
place = {United States},
year = {2015},
month = {12}
}