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Title: Role of substrate temperature at graphene synthesis in an arc discharge

Authors:
ORCiD logo [1] ;  [2] ;  [1]
  1. Department of Mechanical & Aerospace Engineering, The George Washington University, Washington, District of Columbia 20052, USA
  2. School of Aeronautics and Astronautics, Purdue University, West Lafayette, Indiana 47907, USA
Publication Date:
Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Name: Journal of Applied Physics Journal Volume: 118 Journal Issue: 10; Journal ID: ISSN 0021-8979
Publisher:
American Institute of Physics
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
OSTI Identifier:
1229662

Fang, Xiuqi, Shashurin, Alexey, and Keidar, Michael. Role of substrate temperature at graphene synthesis in an arc discharge. United States: N. p., Web. doi:10.1063/1.4930177.
Fang, Xiuqi, Shashurin, Alexey, & Keidar, Michael. Role of substrate temperature at graphene synthesis in an arc discharge. United States. doi:10.1063/1.4930177.
Fang, Xiuqi, Shashurin, Alexey, and Keidar, Michael. 2015. "Role of substrate temperature at graphene synthesis in an arc discharge". United States. doi:10.1063/1.4930177.
@article{osti_1229662,
title = {Role of substrate temperature at graphene synthesis in an arc discharge},
author = {Fang, Xiuqi and Shashurin, Alexey and Keidar, Michael},
abstractNote = {},
doi = {10.1063/1.4930177},
journal = {Journal of Applied Physics},
number = 10,
volume = 118,
place = {United States},
year = {2015},
month = {9}
}

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