Tailoring the electronic transitions of NdNiO3 films through (111)pc oriented interfaces
Abstract
Bulk NdNiO3 and thin films grown along the pseudocubic (001)pc axis display a 1st order metal to insulator transition (MIT) together with a Néel transition at T = 200 K. Here, we show that for NdNiO3 films deposited on (111)pc NdGaO3, the MIT occurs at T = 335 K and the Néel transition at T = 230 K. By comparing transport and magnetic properties of layers grown on substrates with different symmetries and lattice parameters, we demonstrate a particularly large tuning when the epitaxy is realized on (111)pc surfaces. We attribute this effect to the specific lattice matching conditions imposed along this direction when using orthorhombic substrates.
- Authors:
-
[1];
[3];
[3];
- Univ. of Geneva (Switzerland)
- Paul Scherrer Inst. (PSI), Villigen (Switzerland); Brookhaven National Lab. (BNL), Upton, NY (United States)
- Canadian Light Source, Saskatoon, SK (Canada)
- Univ. of Geneva (Switzerland); Service de Physique de l’Etat Condensé (CNRS UMR 3680), Gif-sur-Yvette (France)
- Univ. of Geneva (Switzerland); Univ. College London (United Kingdom)
- Univ. of British Columbia, Vancouver, BC (Canada)
- Paul Scherrer Inst. (PSI), Villigen (Switzerland)
- Publication Date:
- Research Org.:
- Brookhaven National Lab. (BNL), Upton, NY (United States)
- Sponsoring Org.:
- USDOE Office of Science (SC), Basic Energy Sciences (BES); European Research Council (ERC); CFI; Natural Sciences and Engineering Research Council of Canada (NSERC); USNRC; CIHR; Government of Saskatchewan; WD Canada; University of Saskatchewan
- OSTI Identifier:
- 1229442
- Report Number(s):
- BNL-111518-2015-JA
Journal ID: ISSN 2166-532X
- Grant/Contract Number:
- SC00112704
- Resource Type:
- Accepted Manuscript
- Journal Name:
- APL Materials
- Additional Journal Information:
- Journal Volume: 3; Journal Issue: 6; Journal ID: ISSN 2166-532X
- Publisher:
- American Institute of Physics (AIP)
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE; Magnetic hysteresis; Bragg vector; Crystal lattices; Perovskites; Transport properties; Epitaxy; Atomic force microscopy; Thin films; Phase transitions; X-ray reflectivity
Citation Formats
Catalano, Sara, Gibert, M., Bisogni, V., He, F., Sutarto, R., Viret, M., Zubko, P., Scherwitzl, R., Sawatzky, G. A., Schmitt, T., and Triscone, J. -M. Tailoring the electronic transitions of NdNiO3 films through (111)pc oriented interfaces. United States: N. p., 2015.
Web. doi:10.1063/1.4919803.
Catalano, Sara, Gibert, M., Bisogni, V., He, F., Sutarto, R., Viret, M., Zubko, P., Scherwitzl, R., Sawatzky, G. A., Schmitt, T., & Triscone, J. -M. Tailoring the electronic transitions of NdNiO3 films through (111)pc oriented interfaces. United States. https://doi.org/10.1063/1.4919803
Catalano, Sara, Gibert, M., Bisogni, V., He, F., Sutarto, R., Viret, M., Zubko, P., Scherwitzl, R., Sawatzky, G. A., Schmitt, T., and Triscone, J. -M. Mon .
"Tailoring the electronic transitions of NdNiO3 films through (111)pc oriented interfaces". United States. https://doi.org/10.1063/1.4919803. https://www.osti.gov/servlets/purl/1229442.
@article{osti_1229442,
title = {Tailoring the electronic transitions of NdNiO3 films through (111)pc oriented interfaces},
author = {Catalano, Sara and Gibert, M. and Bisogni, V. and He, F. and Sutarto, R. and Viret, M. and Zubko, P. and Scherwitzl, R. and Sawatzky, G. A. and Schmitt, T. and Triscone, J. -M.},
abstractNote = {Bulk NdNiO3 and thin films grown along the pseudocubic (001)pc axis display a 1st order metal to insulator transition (MIT) together with a Néel transition at T = 200 K. Here, we show that for NdNiO3 films deposited on (111)pc NdGaO3, the MIT occurs at T = 335 K and the Néel transition at T = 230 K. By comparing transport and magnetic properties of layers grown on substrates with different symmetries and lattice parameters, we demonstrate a particularly large tuning when the epitaxy is realized on (111)pc surfaces. We attribute this effect to the specific lattice matching conditions imposed along this direction when using orthorhombic substrates.},
doi = {10.1063/1.4919803},
journal = {APL Materials},
number = 6,
volume = 3,
place = {United States},
year = {Mon May 04 00:00:00 EDT 2015},
month = {Mon May 04 00:00:00 EDT 2015}
}
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