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Title: Pressure-induced structures of Si-doped HfO 2

Authors:
; ; ; ; ;
Publication Date:
Grant/Contract Number:
AC02-06CH11357; FG02-99ER45775; NA0001974
Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 117; Journal Issue: 23; Related Information: CHORUS Timestamp: 2016-12-22 04:16:57; Journal ID: ISSN 0021-8979
Publisher:
American Institute of Physics
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
OSTI Identifier:
1228275