Titanium dioxide/silicon hole-blocking selective contact to enable double-heterojunction crystalline silicon-based solar cell
- Authors:
-
[1];
[3];
[3];
- Princeton Institute for the Science and Technology of Materials (PRISM), Princeton, New Jersey 08544, USA, Department of Electrical Engineering, Princeton University, Princeton, New Jersey 08544, USA
- Princeton Institute for the Science and Technology of Materials (PRISM), Princeton, New Jersey 08544, USA
- Princeton Institute for the Science and Technology of Materials (PRISM), Princeton, New Jersey 08544, USA, Department of Chemistry, Princeton University, Princeton, New Jersey 08544, USA
- Publication Date:
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1226725
- Grant/Contract Number:
- EE0005315
- Resource Type:
- Publisher's Accepted Manuscript
- Journal Name:
- Applied Physics Letters
- Additional Journal Information:
- Journal Name: Applied Physics Letters Journal Volume: 106 Journal Issue: 12; Journal ID: ISSN 0003-6951
- Publisher:
- American Institute of Physics
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Nagamatsu, Ken A., Avasthi, Sushobhan, Sahasrabudhe, Girija, Man, Gabriel, Jhaveri, Janam, Berg, Alexander H., Schwartz, Jeffrey, Kahn, Antoine, Wagner, Sigurd, and Sturm, James C. Titanium dioxide/silicon hole-blocking selective contact to enable double-heterojunction crystalline silicon-based solar cell. United States: N. p., 2015.
Web. doi:10.1063/1.4916540.
Nagamatsu, Ken A., Avasthi, Sushobhan, Sahasrabudhe, Girija, Man, Gabriel, Jhaveri, Janam, Berg, Alexander H., Schwartz, Jeffrey, Kahn, Antoine, Wagner, Sigurd, & Sturm, James C. Titanium dioxide/silicon hole-blocking selective contact to enable double-heterojunction crystalline silicon-based solar cell. United States. https://doi.org/10.1063/1.4916540
Nagamatsu, Ken A., Avasthi, Sushobhan, Sahasrabudhe, Girija, Man, Gabriel, Jhaveri, Janam, Berg, Alexander H., Schwartz, Jeffrey, Kahn, Antoine, Wagner, Sigurd, and Sturm, James C. Thu .
"Titanium dioxide/silicon hole-blocking selective contact to enable double-heterojunction crystalline silicon-based solar cell". United States. https://doi.org/10.1063/1.4916540.
@article{osti_1226725,
title = {Titanium dioxide/silicon hole-blocking selective contact to enable double-heterojunction crystalline silicon-based solar cell},
author = {Nagamatsu, Ken A. and Avasthi, Sushobhan and Sahasrabudhe, Girija and Man, Gabriel and Jhaveri, Janam and Berg, Alexander H. and Schwartz, Jeffrey and Kahn, Antoine and Wagner, Sigurd and Sturm, James C.},
abstractNote = {},
doi = {10.1063/1.4916540},
journal = {Applied Physics Letters},
number = 12,
volume = 106,
place = {United States},
year = {Thu Mar 26 00:00:00 EDT 2015},
month = {Thu Mar 26 00:00:00 EDT 2015}
}
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https://doi.org/10.1063/1.4916540
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