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Title: Complex oxide growth using simultaneous in situ reflection high-energy electron diffraction and x-ray reflectivity: When is one layer complete?

Authors:
 [1];  [2];  [3];  [4]; ORCiD logo [5];  [2];  [6]
  1. Department of Physics and Astronomy, Ithaca College, Ithaca, New York 14850, USA, School of Applied and Engineering Physics, Cornell University, Ithaca, New York 14853, USA
  2. Cornell High Energy Synchrotron Source, Cornell University, Ithaca, New York 14853, USA
  3. School of Applied and Engineering Physics, Cornell University, Ithaca, New York 14853, USA
  4. Department of Physics and Astronomy, Ithaca College, Ithaca, New York 14850, USA, Cornell High Energy Synchrotron Source, Cornell University, Ithaca, New York 14853, USA
  5. Cornell High Energy Synchrotron Source, Cornell University, Ithaca, New York 14853, USA, Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853, USA
  6. School of Applied and Engineering Physics, Cornell University, Ithaca, New York 14853, USA, Cornell High Energy Synchrotron Source, Cornell University, Ithaca, New York 14853, USA
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1226700
Grant/Contract Number:  
SC0001086
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Name: Applied Physics Letters Journal Volume: 106 Journal Issue: 3; Journal ID: ISSN 0003-6951
Publisher:
American Institute of Physics
Country of Publication:
United States
Language:
English

Citation Formats

Sullivan, M. C., Ward, M. J., Gutiérrez-Llorente, Araceli, Adler, Eli R., Joress, H., Woll, A., and Brock, J. D. Complex oxide growth using simultaneous in situ reflection high-energy electron diffraction and x-ray reflectivity: When is one layer complete?. United States: N. p., 2015. Web. doi:10.1063/1.4906419.
Sullivan, M. C., Ward, M. J., Gutiérrez-Llorente, Araceli, Adler, Eli R., Joress, H., Woll, A., & Brock, J. D. Complex oxide growth using simultaneous in situ reflection high-energy electron diffraction and x-ray reflectivity: When is one layer complete?. United States. doi:10.1063/1.4906419.
Sullivan, M. C., Ward, M. J., Gutiérrez-Llorente, Araceli, Adler, Eli R., Joress, H., Woll, A., and Brock, J. D. Thu . "Complex oxide growth using simultaneous in situ reflection high-energy electron diffraction and x-ray reflectivity: When is one layer complete?". United States. doi:10.1063/1.4906419.
@article{osti_1226700,
title = {Complex oxide growth using simultaneous in situ reflection high-energy electron diffraction and x-ray reflectivity: When is one layer complete?},
author = {Sullivan, M. C. and Ward, M. J. and Gutiérrez-Llorente, Araceli and Adler, Eli R. and Joress, H. and Woll, A. and Brock, J. D.},
abstractNote = {},
doi = {10.1063/1.4906419},
journal = {Applied Physics Letters},
number = 3,
volume = 106,
place = {United States},
year = {2015},
month = {1}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
DOI: 10.1063/1.4906419

Citation Metrics:
Cited by: 10 works
Citation information provided by
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Works referenced in this record:

Atomic Control of the SrTiO3 Crystal Surface
journal, December 1994