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Title: Sub-10 nm nanopantography

Authors:
 [1] ;  [1] ;  [2] ;  [1]
  1. Plasma Processing Laboratory, Department of Chemical and Biomolecular Engineering, University of Houston, Houston, Texas 77204, USA
  2. Department of Electrical and Computer Engineering, University of Houston, Houston, Texas 77204, USA
Publication Date:
Grant/Contract Number:
SC0001939
Type:
Publisher's Accepted Manuscript
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Name: Applied Physics Letters Journal Volume: 107 Journal Issue: 19; Journal ID: ISSN 0003-6951
Publisher:
American Institute of Physics
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
OSTI Identifier:
1225986

Tian, Siyuan, Donnelly, Vincent M., Ruchhoeft, Paul, and Economou, Demetre J.. Sub-10 nm nanopantography. United States: N. p., Web. doi:10.1063/1.4935552.
Tian, Siyuan, Donnelly, Vincent M., Ruchhoeft, Paul, & Economou, Demetre J.. Sub-10 nm nanopantography. United States. doi:10.1063/1.4935552.
Tian, Siyuan, Donnelly, Vincent M., Ruchhoeft, Paul, and Economou, Demetre J.. 2015. "Sub-10 nm nanopantography". United States. doi:10.1063/1.4935552.
@article{osti_1225986,
title = {Sub-10 nm nanopantography},
author = {Tian, Siyuan and Donnelly, Vincent M. and Ruchhoeft, Paul and Economou, Demetre J.},
abstractNote = {},
doi = {10.1063/1.4935552},
journal = {Applied Physics Letters},
number = 19,
volume = 107,
place = {United States},
year = {2015},
month = {11}
}

Works referenced in this record:

Continuous base identification for single-molecule nanopore DNA sequencing
journal, February 2009
  • Clarke, James; Wu, Hai-Chen; Jayasinghe, Lakmal
  • Nature Nanotechnology, Vol. 4, Issue 4, p. 265-270
  • DOI: 10.1038/nnano.2009.12

Atomically Thin MoS2 A New Direct-Gap Semiconductor
journal, September 2010