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Title: A modular reactor design for in situ synchrotron x-ray investigation of atomic layer deposition processes

Authors:
 [1] ;  [2] ;  [1] ; ORCiD logo [3] ;  [4] ; ORCiD logo [4] ;  [1] ;  [3] ;  [5] ;  [1]
  1. Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439, USA
  2. Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439, USA, Department of Chemistry, Illinois Institute of Technology, Chicago, Illinois 60616, USA
  3. Energy Systems Division, Argonne National Laboratory, Argonne, Illinois 60439, USA
  4. X-ray Science Division, Argonne National Laboratory, Argonne, Illinois 60439, USA
  5. Department of Chemistry, Illinois Institute of Technology, Chicago, Illinois 60616, USA, Chemical Science and Engineering Division, Argonne National Laboratory, Argonne, Illinois 60439, USA
Publication Date:
Grant/Contract Number:
AC02-06CH11357; SC0001059
Type:
Publisher's Accepted Manuscript
Journal Name:
Review of Scientific Instruments
Additional Journal Information:
Journal Name: Review of Scientific Instruments Journal Volume: 86 Journal Issue: 11; Journal ID: ISSN 0034-6748
Publisher:
American Institute of Physics
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
OSTI Identifier:
1224877

Klug, Jeffrey A., Weimer, Matthew S., Emery, Jonathan D., Yanguas-Gil, Angel, Seifert, Sönke, Schlepütz, Christian M., Martinson, Alex B. F., Elam, Jeffrey W., Hock, Adam S., and Proslier, Thomas. A modular reactor design for in situ synchrotron x-ray investigation of atomic layer deposition processes. United States: N. p., Web. doi:10.1063/1.4934807.
Klug, Jeffrey A., Weimer, Matthew S., Emery, Jonathan D., Yanguas-Gil, Angel, Seifert, Sönke, Schlepütz, Christian M., Martinson, Alex B. F., Elam, Jeffrey W., Hock, Adam S., & Proslier, Thomas. A modular reactor design for in situ synchrotron x-ray investigation of atomic layer deposition processes. United States. doi:10.1063/1.4934807.
Klug, Jeffrey A., Weimer, Matthew S., Emery, Jonathan D., Yanguas-Gil, Angel, Seifert, Sönke, Schlepütz, Christian M., Martinson, Alex B. F., Elam, Jeffrey W., Hock, Adam S., and Proslier, Thomas. 2015. "A modular reactor design for in situ synchrotron x-ray investigation of atomic layer deposition processes". United States. doi:10.1063/1.4934807.
@article{osti_1224877,
title = {A modular reactor design for in situ synchrotron x-ray investigation of atomic layer deposition processes},
author = {Klug, Jeffrey A. and Weimer, Matthew S. and Emery, Jonathan D. and Yanguas-Gil, Angel and Seifert, Sönke and Schlepütz, Christian M. and Martinson, Alex B. F. and Elam, Jeffrey W. and Hock, Adam S. and Proslier, Thomas},
abstractNote = {},
doi = {10.1063/1.4934807},
journal = {Review of Scientific Instruments},
number = 11,
volume = 86,
place = {United States},
year = {2015},
month = {11}
}

Works referenced in this record:

Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process
journal, June 2005
  • Puurunen, Riikka L.
  • Journal of Applied Physics, Vol. 97, Issue 12, Article No. 121301
  • DOI: 10.1063/1.1940727

Viscous flow reactor with quartz crystal microbalance for thin film growth by atomic layer deposition
journal, August 2002
  • Elam, J. W.; Groner, M. D.; George, S. M.
  • Review of Scientific Instruments, Vol. 73, Issue 8, p. 2981-2987
  • DOI: 10.1063/1.1490410

Surface chemistry of Al2O3 deposition using Al(CH3)3 and H2O in a binary reaction sequence
journal, January 1995