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Title: Diffraction properties of multilayer Laue lenses with an aperture of 102 µm and WSi2/Al bilayers

Here, we report on the characterization of a multilayer Laue lens (MLL) with large acceptance, made of a novel WSi2/Al bilayer system. Fabrication of multilayers with large deposition thickness is required to obtain MLL structures with sufficient apertures capable of accepting the full lateral coherence length of x-rays at typical nanofocusing beamlines. To date, the total deposition thickness has been limited by stress-buildup in the multilayer. We were able to grow WSi2/Al with low grown-in stress, and asses the degree of stress reduction. X-ray diffraction experiments were conducted at beamline 1-BM at the Advanced Photon Source. We used monochromatic x-rays with a photon energy of 12 keV and a bandwidth of ΔE/E=5.4 ∙ 10-4. The MLL was grown with parallel layer interfaces, and was designed to have a large focal length of 9.6 mm. The mounted lens was 2.7 mm in width. We found and quantified kinks and bending of sections of the MLL. Sections with bending were found to partly have a systematic progression in the interface angles. We also observed kinking in some, but not all, areas. The measurements are compared with dynamic diffraction calculations made with Coupled Wave Theory. Finally our data are plotted showing the diffractionmore » efficiency as a function of the external tilting angle of the entire mounted lens. This way of plotting the data was found to provide an overview into the diffraction properties of the whole lens, and enabled the following layer tilt analyses.« less
 [1] ;  [2] ;  [3] ;  [4] ;  [4] ;  [5] ;  [5] ;  [5] ;  [5] ;  [5] ;  [5]
  1. Argonne National Lab. (ANL), Argonne, IL (United States). X-ray Science Division; Fraunhofer Institute for Material and Beam Technology, Dresden (Germany)
  2. Argonne National Lab. (ANL), Argonne, IL (United States). X-ray Science Division; European XFEL GmbH, Hamburg (Germany)
  3. Argonne National Lab. (ANL), Argonne, IL (United States). X-ray Science Division; Brookhaven National Lab. (BNL), Upton, NY (United States)
  4. Brookhaven National Lab. (BNL), Upton, NY (United States)
  5. Argonne National Lab. (ANL), Argonne, IL (United States). X-ray Science Division
Publication Date:
Report Number(s):
Journal ID: ISSN 1094-4087; OPEXFF
Grant/Contract Number:
SC00112704; AC02-06CH11357
Published Article
Journal Name:
Optics Express
Additional Journal Information:
Journal Volume: 23; Journal Issue: 21; Journal ID: ISSN 1094-4087
Optical Society of America (OSA)
Research Org:
Brookhaven National Laboratory (BNL), Upton, NY (United States)
Sponsoring Org:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
Country of Publication:
United States
OSTI Identifier:
Alternate Identifier(s):
OSTI ID: 1335399