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Title: Achieving hard X-ray nanofocusing using a wedged multilayer Laue lens

We report on the fabrication and the characterization of a wedged multilayer Laue lens for x-ray nanofocusing. The lens was fabricated using a sputtering deposition technique, in which a specially designed mask was employed to introduce a thickness gradient in the lateral direction of the multilayer. X-ray characterization shows an efficiency of 27% and a focus size of 26 nm at 14.6 keV, in a good agreement with theoretical calculations. These results indicate that the desired wedging is achieved in the fabricated structure. We anticipate that continuous development on wedged MLLs will advance x-ray nanofocusing optics to new frontiers and enrich capabilities and opportunities for hard X-ray microscopy.
 [1] ;  [2] ;  [1] ;  [1] ;  [3] ;  [3] ;  [1] ;  [1] ;  [1] ;  [3] ;  [4] ;  [1] ;  [1]
  1. Brookhaven National Lab. (BNL), Upton, NY (United States)
  2. Brookhaven National Lab. (BNL), Upton, NY (United States); Argonne National Lab. (ANL), Argonne, IL (United States)
  3. Argonne National Lab. (ANL), Argonne, IL (United States)
  4. Univ. College London, London (United Kingdom); Research Complex at Hartwell, Oxfordshire (United Kingdom)
Publication Date:
Grant/Contract Number:
AC02-06CH11357; SC00112704; 227711; DMR-9724294; AC0206CH11357
Published Article
Journal Name:
Optics Express
Additional Journal Information:
Journal Volume: 23; Journal Issue: 10; Journal ID: ISSN 1094-4087
Optical Society of America (OSA)
Research Org:
Argonne National Lab. (ANL), Argonne, IL (United States); Brookhaven National Laboratory (BNL), Upton, NY (United States)
Sponsoring Org:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
Country of Publication:
United States
42 ENGINEERING; X-ray optics; deposition and fabrication; phase retrieval; image reconstruction techniques
OSTI Identifier:
Alternate Identifier(s):
OSTI ID: 1215667