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Title: Order within disorder: The atomic structure of ion-beam sputtered amorphous tantala (a-Ta₂O₅)

Amorphous tantala (a-Ta₂O₅) is a technologically important material often used in high-performance coatings. Understanding this material at the atomic level provides a way to further improve performance. This work details extended X-ray absorption fine structure measurements of a-Ta₂O₅ coatings, where high-quality experimental data and theoretical fits have allowed a detailed interpretation of the nearest-neighbor distributions. It was found that the tantalum atom is surrounded by four shells of atoms in sequence; oxygen, tantalum, oxygen, and tantalum. A discussion is also included on how these models can be interpreted within the context of published crystalline Ta₂O₅ and other a-T₂O₅ studies.
 [1] ;  [1] ;  [2] ;  [1] ;  [3] ;  [4] ;  [5] ;  [1] ;  [2] ;  [6] ;  [6] ;  [6] ;  [1] ;  [6] ;  [3] ;  [1]
  1. Stanford Univ., CA (United States). E.L. Ginzton Lab.
  2. California Inst. of Technology (CalTech), Pasadena, CA (United States). LIGO Lab.
  3. Stanford Univ., Stanford, CA (United States). Dept. of Geological and Environmental Sciences
  4. SLAC National Accelerator Lab., Menlo Park, CA (United States). Stanford Synchrotron Radiation Lightsource (SSRL)
  5. SLAC National Accelerator Lab., Menlo Park, CA (United States)
  6. Univ. of Glasgow (United Kingdom), School of Physics and Astronomy, SUPA
Publication Date:
Grant/Contract Number:
Accepted Manuscript
Journal Name:
APL Materials
Additional Journal Information:
Journal Volume: 3; Journal Issue: 3; Journal ID: ISSN 2166-532X
American Institute of Physics (AIP)
Research Org:
SLAC National Accelerator Lab., Menlo Park, CA (United States)
Sponsoring Org:
Country of Publication:
United States
36 MATERIALS SCIENCE; extended x-ray absorption fine structure spectroscopy; tantalum; crystal structure; shell model; materials properties
OSTI Identifier: