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Title: Mechanical Removal and Rescreening of Local Screening Charges at Ferroelectric Surfaces

Abstract

In this paper, we report the kinetics of screening charge removal and rescreening on periodically poled lithium niobate using charge-gradient microscopy and electrostatic force microscopy (EFM). A minimum pressure needs to be applied to initiate mechanical screening charge removal, and increasing the pressure leads to further removal of charge until a threshold is reached when all screening charges are removed. We fit all rescreening EFM contrast curves under various pressures into a universal exponential decay. Finally, the findings imply that we can control the screening degree of ferroelectric surfaces by mechanical means without affecting the polarization underneath.

Authors:
 [1];  [2];  [2];  [1];  [2];  [1]
  1. Argonne National Lab. (ANL), Argonne, IL (United States). Nanoscience and Technology Division
  2. Argonne National Lab. (ANL), Argonne, IL (United States). Materials Science Division
Publication Date:
Research Org.:
Argonne National Laboratory (ANL), Argonne, IL (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES)
OSTI Identifier:
1357474
Alternate Identifier(s):
OSTI ID: 1180365
Grant/Contract Number:  
AC02-06CH11357
Resource Type:
Accepted Manuscript
Journal Name:
Physical Review Applied
Additional Journal Information:
Journal Volume: 3; Journal Issue: 1; Journal ID: ISSN 2331-7019
Publisher:
American Physical Society
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; charge gradient microscopy; electrostatic force microscopy; ferroelectric surface; kinetics of adsorption; piezoresponse force microscopy

Citation Formats

Tong, Sheng, Park, Woon Ik, Choi, Yoon-Young, Stan, Liliana, Hong, Seungbum, and Roelofs, Andreas. Mechanical Removal and Rescreening of Local Screening Charges at Ferroelectric Surfaces. United States: N. p., 2015. Web. doi:10.1103/PhysRevApplied.3.014003.
Tong, Sheng, Park, Woon Ik, Choi, Yoon-Young, Stan, Liliana, Hong, Seungbum, & Roelofs, Andreas. Mechanical Removal and Rescreening of Local Screening Charges at Ferroelectric Surfaces. United States. https://doi.org/10.1103/PhysRevApplied.3.014003
Tong, Sheng, Park, Woon Ik, Choi, Yoon-Young, Stan, Liliana, Hong, Seungbum, and Roelofs, Andreas. Tue . "Mechanical Removal and Rescreening of Local Screening Charges at Ferroelectric Surfaces". United States. https://doi.org/10.1103/PhysRevApplied.3.014003. https://www.osti.gov/servlets/purl/1357474.
@article{osti_1357474,
title = {Mechanical Removal and Rescreening of Local Screening Charges at Ferroelectric Surfaces},
author = {Tong, Sheng and Park, Woon Ik and Choi, Yoon-Young and Stan, Liliana and Hong, Seungbum and Roelofs, Andreas},
abstractNote = {In this paper, we report the kinetics of screening charge removal and rescreening on periodically poled lithium niobate using charge-gradient microscopy and electrostatic force microscopy (EFM). A minimum pressure needs to be applied to initiate mechanical screening charge removal, and increasing the pressure leads to further removal of charge until a threshold is reached when all screening charges are removed. We fit all rescreening EFM contrast curves under various pressures into a universal exponential decay. Finally, the findings imply that we can control the screening degree of ferroelectric surfaces by mechanical means without affecting the polarization underneath.},
doi = {10.1103/PhysRevApplied.3.014003},
journal = {Physical Review Applied},
number = 1,
volume = 3,
place = {United States},
year = {Tue Jan 20 00:00:00 EST 2015},
month = {Tue Jan 20 00:00:00 EST 2015}
}

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Cited by: 19 works
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