Mechanical Removal and Rescreening of Local Screening Charges at Ferroelectric Surfaces
Abstract
In this paper, we report the kinetics of screening charge removal and rescreening on periodically poled lithium niobate using charge-gradient microscopy and electrostatic force microscopy (EFM). A minimum pressure needs to be applied to initiate mechanical screening charge removal, and increasing the pressure leads to further removal of charge until a threshold is reached when all screening charges are removed. We fit all rescreening EFM contrast curves under various pressures into a universal exponential decay. Finally, the findings imply that we can control the screening degree of ferroelectric surfaces by mechanical means without affecting the polarization underneath.
- Authors:
-
- Argonne National Lab. (ANL), Argonne, IL (United States). Nanoscience and Technology Division
- Argonne National Lab. (ANL), Argonne, IL (United States). Materials Science Division
- Publication Date:
- Research Org.:
- Argonne National Laboratory (ANL), Argonne, IL (United States)
- Sponsoring Org.:
- USDOE Office of Science (SC), Basic Energy Sciences (BES)
- OSTI Identifier:
- 1357474
- Alternate Identifier(s):
- OSTI ID: 1180365
- Grant/Contract Number:
- AC02-06CH11357
- Resource Type:
- Accepted Manuscript
- Journal Name:
- Physical Review Applied
- Additional Journal Information:
- Journal Volume: 3; Journal Issue: 1; Journal ID: ISSN 2331-7019
- Publisher:
- American Physical Society
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; charge gradient microscopy; electrostatic force microscopy; ferroelectric surface; kinetics of adsorption; piezoresponse force microscopy
Citation Formats
Tong, Sheng, Park, Woon Ik, Choi, Yoon-Young, Stan, Liliana, Hong, Seungbum, and Roelofs, Andreas. Mechanical Removal and Rescreening of Local Screening Charges at Ferroelectric Surfaces. United States: N. p., 2015.
Web. doi:10.1103/PhysRevApplied.3.014003.
Tong, Sheng, Park, Woon Ik, Choi, Yoon-Young, Stan, Liliana, Hong, Seungbum, & Roelofs, Andreas. Mechanical Removal and Rescreening of Local Screening Charges at Ferroelectric Surfaces. United States. https://doi.org/10.1103/PhysRevApplied.3.014003
Tong, Sheng, Park, Woon Ik, Choi, Yoon-Young, Stan, Liliana, Hong, Seungbum, and Roelofs, Andreas. Tue .
"Mechanical Removal and Rescreening of Local Screening Charges at Ferroelectric Surfaces". United States. https://doi.org/10.1103/PhysRevApplied.3.014003. https://www.osti.gov/servlets/purl/1357474.
@article{osti_1357474,
title = {Mechanical Removal and Rescreening of Local Screening Charges at Ferroelectric Surfaces},
author = {Tong, Sheng and Park, Woon Ik and Choi, Yoon-Young and Stan, Liliana and Hong, Seungbum and Roelofs, Andreas},
abstractNote = {In this paper, we report the kinetics of screening charge removal and rescreening on periodically poled lithium niobate using charge-gradient microscopy and electrostatic force microscopy (EFM). A minimum pressure needs to be applied to initiate mechanical screening charge removal, and increasing the pressure leads to further removal of charge until a threshold is reached when all screening charges are removed. We fit all rescreening EFM contrast curves under various pressures into a universal exponential decay. Finally, the findings imply that we can control the screening degree of ferroelectric surfaces by mechanical means without affecting the polarization underneath.},
doi = {10.1103/PhysRevApplied.3.014003},
journal = {Physical Review Applied},
number = 1,
volume = 3,
place = {United States},
year = {Tue Jan 20 00:00:00 EST 2015},
month = {Tue Jan 20 00:00:00 EST 2015}
}
Web of Science
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