Device Isolation in Hybrid Field-Effect Transistors by Semiconductor Micropatterning Using Picosecond Lasers

Ireland, Robert M.; Liu, Yu; Spalenka, Josef W.; Jaiswal, Supriya; Fukumitsu, Kenshi; Oishi, Shingo; Saito, Hiroshi; Ryosuke, Mochizuki; Evans, Paul G.; Katz, Howard E.

doi:10.1103/PhysRevApplied.2.044006

Title: Device Isolation in Hybrid Field-Effect Transistors by Semiconductor Micropatterning Using Picosecond Lasers

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Authors:: Ireland, Robert M.; Liu, Yu; Spalenka, Josef W.; Jaiswal, Supriya; Fukumitsu, Kenshi; Oishi, Shingo; Saito, Hiroshi; Ryosuke, Mochizuki; Evans, Paul G.; Katz, Howard E.

Publication Date:: Wed Oct 15 00:00:00 EDT 2014

Sponsoring Org.:: USDOE

OSTI Identifier:: 1180119

Grant/Contract Number:: FG02-07ER46465

Resource Type:: Publisher's Accepted Manuscript

Journal Name:: Physical Review Applied

Additional Journal Information:: Journal Volume: 2; Journal Issue: 4; Journal ID: ISSN 2331-7019

Publisher:: American Physical Society

Country of Publication:: United States

Language:: English

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                    Ireland, Robert M., Liu, Yu, Spalenka, Josef W., Jaiswal, Supriya, Fukumitsu, Kenshi, Oishi, Shingo, Saito, Hiroshi, Ryosuke, Mochizuki, Evans, Paul G., and Katz, Howard E. Device Isolation in Hybrid Field-Effect Transistors by Semiconductor Micropatterning Using Picosecond Lasers.  United States: N. p., 2014. 
Web.  doi:10.1103/PhysRevApplied.2.044006.

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                    Ireland, Robert M., Liu, Yu, Spalenka, Josef W., Jaiswal, Supriya, Fukumitsu, Kenshi, Oishi, Shingo, Saito, Hiroshi, Ryosuke, Mochizuki, Evans, Paul G., & Katz, Howard E. Device Isolation in Hybrid Field-Effect Transistors by Semiconductor Micropatterning Using Picosecond Lasers.  United States.  https://doi.org/10.1103/PhysRevApplied.2.044006

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                    Ireland, Robert M., Liu, Yu, Spalenka, Josef W., Jaiswal, Supriya, Fukumitsu, Kenshi, Oishi, Shingo, Saito, Hiroshi, Ryosuke, Mochizuki, Evans, Paul G., and Katz, Howard E. Wed .  
"Device Isolation in Hybrid Field-Effect Transistors by Semiconductor Micropatterning Using Picosecond Lasers".  United States.  https://doi.org/10.1103/PhysRevApplied.2.044006.

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@article{osti_1180119,

  title        = {Device Isolation in Hybrid Field-Effect Transistors by Semiconductor Micropatterning Using Picosecond Lasers},

  author       = {Ireland, Robert M. and Liu, Yu and Spalenka, Josef W. and Jaiswal, Supriya and Fukumitsu, Kenshi and Oishi, Shingo and Saito, Hiroshi and Ryosuke, Mochizuki and Evans, Paul G. and Katz, Howard E.},

  abstractNote = {},

  doi          = {10.1103/PhysRevApplied.2.044006},

  journal      = {Physical Review Applied},

  number       = 4,

  volume       = 2,

  place        = {United States},

  year         = {Wed Oct 15 00:00:00 EDT 2014},

  month        = {Wed Oct 15 00:00:00 EDT 2014}

}

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