DOE PAGES title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: 1.9 kV AlGaN/GaN Lateral Schottky Barrier Diodes on Silicon

Abstract

In this letter, we present AlGaN/GaN lateral Schottky barrier diodes on silicon with recessed anodes and dual field plates. A low specific on-resistance RON,SP (5.12 mΩ · cm2), a low turn-on voltage (<0.7 V) and a high reverse breakdown voltage BV (>1.9 kV), were simultaneously achieved in devices with a 25 μm anode/cathode separation, resulting in a power figure-of-merit (FOM) BV2/RON,SP of 727 MW·cm2. The record high breakdown voltage of 1.9 kV is attributed to the dual field plate structure.

Authors:
 [1];  [2];  [1];  [1];  [1];  [1];  [3];  [3];  [1];  [2];  [2]
  1. Univ. of Notre Dame, IN (United States)
  2. Cornell Univ., Ithaca, NY (United States)
  3. IQE, Westborough, MA (United States)
Publication Date:
Research Org.:
Univ. of Notre Dame, IN (United States)
Sponsoring Org.:
USDOE Advanced Research Projects Agency - Energy (ARPA-E)
Contributing Org.:
Cornell University, Ithaca, NY (United States); IQE/HRL, Westborough, MA (United States)
OSTI Identifier:
1170275
Report Number(s):
DOE-UND-AR0000454.1
Journal ID: ISSN 0741-3106; TRN: US1500478
Grant/Contract Number:  
AR0000454
Resource Type:
Accepted Manuscript
Journal Name:
IEEE Electron Device Letters
Additional Journal Information:
Journal Volume: 36; Journal Issue: 4; Journal ID: ISSN 0741-3106
Publisher:
IEEE
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING; Schottky barrier diode, GaN on Silicon, Breakdown voltage, High voltage device, AlGaN/GaN, Field plate

Citation Formats

Zhu, Mingda, Song, Bo, Qi, Meng, Hu, Zongyang, Nomoto, Kazuki, Yan, Xiaodong, Cao, Yu, Johnson, Wayne, Kohn, Erhard, Jena, Debdeep, and Xing, Grace Huili. 1.9 kV AlGaN/GaN Lateral Schottky Barrier Diodes on Silicon. United States: N. p., 2015. Web. doi:10.1109/LED.2015.2404309.
Zhu, Mingda, Song, Bo, Qi, Meng, Hu, Zongyang, Nomoto, Kazuki, Yan, Xiaodong, Cao, Yu, Johnson, Wayne, Kohn, Erhard, Jena, Debdeep, & Xing, Grace Huili. 1.9 kV AlGaN/GaN Lateral Schottky Barrier Diodes on Silicon. United States. https://doi.org/10.1109/LED.2015.2404309
Zhu, Mingda, Song, Bo, Qi, Meng, Hu, Zongyang, Nomoto, Kazuki, Yan, Xiaodong, Cao, Yu, Johnson, Wayne, Kohn, Erhard, Jena, Debdeep, and Xing, Grace Huili. Mon . "1.9 kV AlGaN/GaN Lateral Schottky Barrier Diodes on Silicon". United States. https://doi.org/10.1109/LED.2015.2404309. https://www.osti.gov/servlets/purl/1170275.
@article{osti_1170275,
title = {1.9 kV AlGaN/GaN Lateral Schottky Barrier Diodes on Silicon},
author = {Zhu, Mingda and Song, Bo and Qi, Meng and Hu, Zongyang and Nomoto, Kazuki and Yan, Xiaodong and Cao, Yu and Johnson, Wayne and Kohn, Erhard and Jena, Debdeep and Xing, Grace Huili},
abstractNote = {In this letter, we present AlGaN/GaN lateral Schottky barrier diodes on silicon with recessed anodes and dual field plates. A low specific on-resistance RON,SP (5.12 mΩ · cm2), a low turn-on voltage (<0.7 V) and a high reverse breakdown voltage BV (>1.9 kV), were simultaneously achieved in devices with a 25 μm anode/cathode separation, resulting in a power figure-of-merit (FOM) BV2/RON,SP of 727 MW·cm2. The record high breakdown voltage of 1.9 kV is attributed to the dual field plate structure.},
doi = {10.1109/LED.2015.2404309},
journal = {IEEE Electron Device Letters},
number = 4,
volume = 36,
place = {United States},
year = {Mon Feb 16 00:00:00 EST 2015},
month = {Mon Feb 16 00:00:00 EST 2015}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record

Citation Metrics:
Cited by: 140 works
Citation information provided by
Web of Science

Save / Share:

Works referencing / citing this record:

Low On‐Resistance and Low Trapping Effects in 1200 V Superlattice GaN‐on‐Silicon Heterostructures
journal, November 2019

  • Kabouche, Riad; Abid, Idriss; Püsche, Roland
  • physica status solidi (a), Vol. 217, Issue 7
  • DOI: 10.1002/pssa.201900687

Coherent tunneling in an AlGaN/AlN/GaN heterojunction captured through an analogy with a MOS contact
journal, August 2017


High breakdown single-crystal GaN p-n diodes by molecular beam epitaxy
journal, December 2015

  • Qi, Meng; Nomoto, Kazuki; Zhu, Mingda
  • Applied Physics Letters, Vol. 107, Issue 23
  • DOI: 10.1063/1.4936891

Near unity ideality factor and Shockley-Read-Hall lifetime in GaN-on-GaN p-n diodes with avalanche breakdown
journal, December 2015

  • Hu, Zongyang; Nomoto, Kazuki; Song, Bo
  • Applied Physics Letters, Vol. 107, Issue 24
  • DOI: 10.1063/1.4937436

High breakdown electric field in β-Ga 2 O 3 /graphene vertical barristor heterostructure
journal, January 2018

  • Yan, Xiaodong; Esqueda, Ivan S.; Ma, Jiahui
  • Applied Physics Letters, Vol. 112, Issue 3
  • DOI: 10.1063/1.5002138

Doping and compensation in Al-rich AlGaN grown on single crystal AlN and sapphire by MOCVD
journal, February 2018

  • Bryan, Isaac; Bryan, Zachary; Washiyama, Shun
  • Applied Physics Letters, Vol. 112, Issue 6
  • DOI: 10.1063/1.5011984

2 kV slanted tri-gate GaN-on-Si Schottky barrier diodes with ultra-low leakage current
journal, January 2018

  • Ma, Jun; Matioli, Elison
  • Applied Physics Letters, Vol. 112, Issue 5
  • DOI: 10.1063/1.5012866

Device Design Assessment of GaN Merged P-i-N Schottky Diodes
journal, December 2019


Coherent tunneling in an AlGaN/AlN/GaN heterojunction captured through an analogy with a MOS contact
text, January 2017