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Title: Etalon-induced baseline drift and correction in atom flux sensors based on atomic absorption spectroscopy

Atom flux sensors based on atomic absorption (AA) spectroscopy are of significant interest in thin film growth as they can provide unobtrusive, element specific, real-time flux sensing and control. The ultimate sensitivity and performance of the sensors are strongly affected by the long-term and short term baseline drift. Here we demonstrate that an etalon effect resulting from temperature changes in optical viewport housings is a major source of signal instability which has not been previously considered or corrected by existing methods. We show that small temperature variations in the fused silica viewports can introduce intensity modulations of up to 1.5%, which in turn significantly deteriorate AA sensor performance. Furthermore, this undesirable effect can be at least partially eliminated by reducing the size of the beam and tilting the incident light beam off the viewport normal.
Authors:
 [1] ;  [1]
  1. Pacific Northwest National Lab. (PNNL), Richland, WA (United States)
Publication Date:
Report Number(s):
PNNL-SA-102491
Journal ID: ISSN 0003-6951; APPLAB; 47862; KP1704020
Grant/Contract Number:
AC05-76RL01830; 10122
Type:
Accepted Manuscript
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Volume: 105; Journal Issue: 16; Journal ID: ISSN 0003-6951
Publisher:
American Institute of Physics (AIP)
Research Org:
Pacific Northwest National Lab. (PNNL), Richland, WA (United States). Environmental Molecular Sciences Lab. (EMSL)
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; Atomic absorption; MBE; Baseline drift; Etalon effect; Environmental Molecular Sciences Laboratory
OSTI Identifier:
1167296
Alternate Identifier(s):
OSTI ID: 1224244

Du, Yingge, and Chambers, Scott A. Etalon-induced baseline drift and correction in atom flux sensors based on atomic absorption spectroscopy. United States: N. p., Web. doi:10.1063/1.4898638.
Du, Yingge, & Chambers, Scott A. Etalon-induced baseline drift and correction in atom flux sensors based on atomic absorption spectroscopy. United States. doi:10.1063/1.4898638.
Du, Yingge, and Chambers, Scott A. 2014. "Etalon-induced baseline drift and correction in atom flux sensors based on atomic absorption spectroscopy". United States. doi:10.1063/1.4898638. https://www.osti.gov/servlets/purl/1167296.
@article{osti_1167296,
title = {Etalon-induced baseline drift and correction in atom flux sensors based on atomic absorption spectroscopy},
author = {Du, Yingge and Chambers, Scott A.},
abstractNote = {Atom flux sensors based on atomic absorption (AA) spectroscopy are of significant interest in thin film growth as they can provide unobtrusive, element specific, real-time flux sensing and control. The ultimate sensitivity and performance of the sensors are strongly affected by the long-term and short term baseline drift. Here we demonstrate that an etalon effect resulting from temperature changes in optical viewport housings is a major source of signal instability which has not been previously considered or corrected by existing methods. We show that small temperature variations in the fused silica viewports can introduce intensity modulations of up to 1.5%, which in turn significantly deteriorate AA sensor performance. Furthermore, this undesirable effect can be at least partially eliminated by reducing the size of the beam and tilting the incident light beam off the viewport normal.},
doi = {10.1063/1.4898638},
journal = {Applied Physics Letters},
number = 16,
volume = 105,
place = {United States},
year = {2014},
month = {10}
}