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Title: Tuning the Temperature Domain of Phonon Drag in Thin Films by the Choice of Substrate

Authors:
; ; ; ;
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1104315
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Physical Review Letters
Additional Journal Information:
Journal Volume: 111; Journal Issue: 4; Journal ID: ISSN 0031-9007
Publisher:
American Physical Society
Country of Publication:
United States
Language:
English

Citation Formats

Wang, Guoyu, Endicott, Lynn, Chi, Hang, Lošt’ák, Peter, and Uher, Ctirad. Tuning the Temperature Domain of Phonon Drag in Thin Films by the Choice of Substrate. United States: N. p., 2013. Web. doi:10.1103/PhysRevLett.111.046803.
Wang, Guoyu, Endicott, Lynn, Chi, Hang, Lošt’ák, Peter, & Uher, Ctirad. Tuning the Temperature Domain of Phonon Drag in Thin Films by the Choice of Substrate. United States. doi:10.1103/PhysRevLett.111.046803.
Wang, Guoyu, Endicott, Lynn, Chi, Hang, Lošt’ák, Peter, and Uher, Ctirad. Fri . "Tuning the Temperature Domain of Phonon Drag in Thin Films by the Choice of Substrate". United States. doi:10.1103/PhysRevLett.111.046803.
@article{osti_1104315,
title = {Tuning the Temperature Domain of Phonon Drag in Thin Films by the Choice of Substrate},
author = {Wang, Guoyu and Endicott, Lynn and Chi, Hang and Lošt’ák, Peter and Uher, Ctirad},
abstractNote = {},
doi = {10.1103/PhysRevLett.111.046803},
journal = {Physical Review Letters},
number = 4,
volume = 111,
place = {United States},
year = {2013},
month = {7}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
DOI: 10.1103/PhysRevLett.111.046803

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Cited by: 5 works
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