Tuning the Temperature Domain of Phonon Drag in Thin Films by the Choice of Substrate
- Authors:
- Publication Date:
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1104315
- Resource Type:
- Publisher's Accepted Manuscript
- Journal Name:
- Physical Review Letters
- Additional Journal Information:
- Journal Volume: 111; Journal Issue: 4; Journal ID: ISSN 0031-9007
- Publisher:
- American Physical Society
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Wang, Guoyu, Endicott, Lynn, Chi, Hang, Lošt’ák, Peter, and Uher, Ctirad. Tuning the Temperature Domain of Phonon Drag in Thin Films by the Choice of Substrate. United States: N. p., 2013.
Web. doi:10.1103/PhysRevLett.111.046803.
Wang, Guoyu, Endicott, Lynn, Chi, Hang, Lošt’ák, Peter, & Uher, Ctirad. Tuning the Temperature Domain of Phonon Drag in Thin Films by the Choice of Substrate. United States. https://doi.org/10.1103/PhysRevLett.111.046803
Wang, Guoyu, Endicott, Lynn, Chi, Hang, Lošt’ák, Peter, and Uher, Ctirad. Fri .
"Tuning the Temperature Domain of Phonon Drag in Thin Films by the Choice of Substrate". United States. https://doi.org/10.1103/PhysRevLett.111.046803.
@article{osti_1104315,
title = {Tuning the Temperature Domain of Phonon Drag in Thin Films by the Choice of Substrate},
author = {Wang, Guoyu and Endicott, Lynn and Chi, Hang and Lošt’ák, Peter and Uher, Ctirad},
abstractNote = {},
doi = {10.1103/PhysRevLett.111.046803},
journal = {Physical Review Letters},
number = 4,
volume = 111,
place = {United States},
year = {Fri Jul 26 00:00:00 EDT 2013},
month = {Fri Jul 26 00:00:00 EDT 2013}
}
Free Publicly Available Full Text
Publisher's Version of Record
https://doi.org/10.1103/PhysRevLett.111.046803
https://doi.org/10.1103/PhysRevLett.111.046803
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Cited by: 15 works
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