Pulsed Ion Beam Measurement of the Time Constant of Dynamic Annealing in Si
- Authors:
- Publication Date:
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1103199
- Resource Type:
- Publisher's Accepted Manuscript
- Journal Name:
- Physical Review Letters
- Additional Journal Information:
- Journal Volume: 109; Journal Issue: 9; Journal ID: ISSN 0031-9007
- Publisher:
- American Physical Society
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Myers, M. T., Charnvanichborikarn, S., Shao, L., and Kucheyev, S. O. Pulsed Ion Beam Measurement of the Time Constant of Dynamic Annealing in Si. United States: N. p., 2012.
Web. doi:10.1103/PhysRevLett.109.095502.
Myers, M. T., Charnvanichborikarn, S., Shao, L., & Kucheyev, S. O. Pulsed Ion Beam Measurement of the Time Constant of Dynamic Annealing in Si. United States. doi:10.1103/PhysRevLett.109.095502.
Myers, M. T., Charnvanichborikarn, S., Shao, L., and Kucheyev, S. O. Mon .
"Pulsed Ion Beam Measurement of the Time Constant of Dynamic Annealing in Si". United States. doi:10.1103/PhysRevLett.109.095502.
@article{osti_1103199,
title = {Pulsed Ion Beam Measurement of the Time Constant of Dynamic Annealing in Si},
author = {Myers, M. T. and Charnvanichborikarn, S. and Shao, L. and Kucheyev, S. O.},
abstractNote = {},
doi = {10.1103/PhysRevLett.109.095502},
journal = {Physical Review Letters},
number = 9,
volume = 109,
place = {United States},
year = {2012},
month = {8}
}
Free Publicly Available Full Text
Publisher's Version of Record
DOI: 10.1103/PhysRevLett.109.095502
DOI: 10.1103/PhysRevLett.109.095502
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Cited by: 22 works
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