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Title: Interfacial Bonding and Structure of Bi 2 Te 3 Topological Insulator Films on Si(111) Determined by Surface X-Ray Scattering

Authors:
; ; ; ; ; ; ; ;
Publication Date:
Type:
Publisher's Accepted Manuscript
Journal Name:
Physical Review Letters
Additional Journal Information:
Journal Name: Physical Review Letters Journal Volume: 110 Journal Issue: 22; Journal ID: ISSN 0031-9007
Publisher:
American Physical Society
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
OSTI Identifier:
1102772

Liu, Y., Wang, H. -H., Bian, G., Zhang, Z., Lee, S. S., Fenter, P. A., Tischler, J. Z., Hong, H., and Chiang, T. -C.. Interfacial Bonding and Structure of Bi 2 Te 3 Topological Insulator Films on Si(111) Determined by Surface X-Ray Scattering. United States: N. p., Web. doi:10.1103/PhysRevLett.110.226103.
Liu, Y., Wang, H. -H., Bian, G., Zhang, Z., Lee, S. S., Fenter, P. A., Tischler, J. Z., Hong, H., & Chiang, T. -C.. Interfacial Bonding and Structure of Bi 2 Te 3 Topological Insulator Films on Si(111) Determined by Surface X-Ray Scattering. United States. doi:10.1103/PhysRevLett.110.226103.
Liu, Y., Wang, H. -H., Bian, G., Zhang, Z., Lee, S. S., Fenter, P. A., Tischler, J. Z., Hong, H., and Chiang, T. -C.. 2013. "Interfacial Bonding and Structure of Bi 2 Te 3 Topological Insulator Films on Si(111) Determined by Surface X-Ray Scattering". United States. doi:10.1103/PhysRevLett.110.226103.
@article{osti_1102772,
title = {Interfacial Bonding and Structure of Bi 2 Te 3 Topological Insulator Films on Si(111) Determined by Surface X-Ray Scattering},
author = {Liu, Y. and Wang, H. -H. and Bian, G. and Zhang, Z. and Lee, S. S. and Fenter, P. A. and Tischler, J. Z. and Hong, H. and Chiang, T. -C.},
abstractNote = {},
doi = {10.1103/PhysRevLett.110.226103},
journal = {Physical Review Letters},
number = 22,
volume = 110,
place = {United States},
year = {2013},
month = {5}
}