Interfacial Bonding and Structure of Topological Insulator Films on Si(111) Determined by Surface X-Ray Scattering
Journal Article
·
· Physical Review Letters
- Sponsoring Organization:
- USDOE
- OSTI ID:
- 1102772
- Journal Information:
- Physical Review Letters, Journal Name: Physical Review Letters Vol. 110 Journal Issue: 22; ISSN 0031-9007
- Publisher:
- American Physical SocietyCopyright Statement
- Country of Publication:
- United States
- Language:
- English
Cited by: 7 works
Citation information provided by
Web of Science
Web of Science
Similar Records
Connecting Thermoelectric Performance and Topological-Insulator Behavior: and from First Principles
Massive Suppression of Proximity Pairing in Topological Films on Niobium
Photoemission Circular Dichroism and Spin Polarization of the Topological Surface States in Ultrathin Films
Journal Article
·
2015
· Physical Review Applied
·
OSTI ID:1385301
+1 more
Massive Suppression of Proximity Pairing in Topological Films on Niobium
Journal Article
·
2020
· Physical Review Letters
·
OSTI ID:1633111
+15 more
Photoemission Circular Dichroism and Spin Polarization of the Topological Surface States in Ultrathin Films
Journal Article
·
2015
· Physical Review Letters
·
OSTI ID:1198574
+4 more