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Title: Effect of oxygen gas pressure on the kinetics of alumina film growth during the oxidation of Al(111) at room temperature

Authors:
; ; ;
Publication Date:
Type:
Publisher's Accepted Manuscript
Journal Name:
Physical Review B
Additional Journal Information:
Journal Volume: 84; Journal Issue: 12; Journal ID: ISSN 1098-0121
Publisher:
American Physical Society
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
OSTI Identifier:
1100862

Cai, Na, Zhou, Guangwen, Müller, Kathrin, and Starr, David E. Effect of oxygen gas pressure on the kinetics of alumina film growth during the oxidation of Al(111) at room temperature. United States: N. p., Web. doi:10.1103/PhysRevB.84.125445.
Cai, Na, Zhou, Guangwen, Müller, Kathrin, & Starr, David E. Effect of oxygen gas pressure on the kinetics of alumina film growth during the oxidation of Al(111) at room temperature. United States. doi:10.1103/PhysRevB.84.125445.
Cai, Na, Zhou, Guangwen, Müller, Kathrin, and Starr, David E. 2011. "Effect of oxygen gas pressure on the kinetics of alumina film growth during the oxidation of Al(111) at room temperature". United States. doi:10.1103/PhysRevB.84.125445.
@article{osti_1100862,
title = {Effect of oxygen gas pressure on the kinetics of alumina film growth during the oxidation of Al(111) at room temperature},
author = {Cai, Na and Zhou, Guangwen and Müller, Kathrin and Starr, David E.},
abstractNote = {},
doi = {10.1103/PhysRevB.84.125445},
journal = {Physical Review B},
number = 12,
volume = 84,
place = {United States},
year = {2011},
month = {9}
}