Tuning the Limiting Thickness of a Thin Oxide Layer on Al(111) with Oxygen Gas Pressure
- Authors:
- Publication Date:
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1099754
- Resource Type:
- Publisher's Accepted Manuscript
- Journal Name:
- Physical Review Letters
- Additional Journal Information:
- Journal Name: Physical Review Letters Journal Volume: 107 Journal Issue: 3; Journal ID: ISSN 0031-9007
- Publisher:
- American Physical Society
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Cai, Na, Zhou, Guangwen, Müller, Kathrin, and Starr, David E. Tuning the Limiting Thickness of a Thin Oxide Layer on Al(111) with Oxygen Gas Pressure. United States: N. p., 2011.
Web. doi:10.1103/PhysRevLett.107.035502.
Cai, Na, Zhou, Guangwen, Müller, Kathrin, & Starr, David E. Tuning the Limiting Thickness of a Thin Oxide Layer on Al(111) with Oxygen Gas Pressure. United States. https://doi.org/10.1103/PhysRevLett.107.035502
Cai, Na, Zhou, Guangwen, Müller, Kathrin, and Starr, David E. Mon .
"Tuning the Limiting Thickness of a Thin Oxide Layer on Al(111) with Oxygen Gas Pressure". United States. https://doi.org/10.1103/PhysRevLett.107.035502.
@article{osti_1099754,
title = {Tuning the Limiting Thickness of a Thin Oxide Layer on Al(111) with Oxygen Gas Pressure},
author = {Cai, Na and Zhou, Guangwen and Müller, Kathrin and Starr, David E.},
abstractNote = {},
doi = {10.1103/PhysRevLett.107.035502},
journal = {Physical Review Letters},
number = 3,
volume = 107,
place = {United States},
year = {Mon Jul 11 00:00:00 EDT 2011},
month = {Mon Jul 11 00:00:00 EDT 2011}
}
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https://doi.org/10.1103/PhysRevLett.107.035502
https://doi.org/10.1103/PhysRevLett.107.035502
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