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Title: Tuning the Limiting Thickness of a Thin Oxide Layer on Al(111) with Oxygen Gas Pressure

Authors:
; ; ;
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1099754
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Physical Review Letters
Additional Journal Information:
Journal Name: Physical Review Letters Journal Volume: 107 Journal Issue: 3; Journal ID: ISSN 0031-9007
Publisher:
American Physical Society
Country of Publication:
United States
Language:
English

Citation Formats

Cai, Na, Zhou, Guangwen, Müller, Kathrin, and Starr, David E. Tuning the Limiting Thickness of a Thin Oxide Layer on Al(111) with Oxygen Gas Pressure. United States: N. p., 2011. Web. doi:10.1103/PhysRevLett.107.035502.
Cai, Na, Zhou, Guangwen, Müller, Kathrin, & Starr, David E. Tuning the Limiting Thickness of a Thin Oxide Layer on Al(111) with Oxygen Gas Pressure. United States. doi:10.1103/PhysRevLett.107.035502.
Cai, Na, Zhou, Guangwen, Müller, Kathrin, and Starr, David E. Mon . "Tuning the Limiting Thickness of a Thin Oxide Layer on Al(111) with Oxygen Gas Pressure". United States. doi:10.1103/PhysRevLett.107.035502.
@article{osti_1099754,
title = {Tuning the Limiting Thickness of a Thin Oxide Layer on Al(111) with Oxygen Gas Pressure},
author = {Cai, Na and Zhou, Guangwen and Müller, Kathrin and Starr, David E.},
abstractNote = {},
doi = {10.1103/PhysRevLett.107.035502},
journal = {Physical Review Letters},
number = 3,
volume = 107,
place = {United States},
year = {2011},
month = {7}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
DOI: 10.1103/PhysRevLett.107.035502

Citation Metrics:
Cited by: 28 works
Citation information provided by
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