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Title: Near-field spectroscopy of silicon dioxide thin films

Authors:
; ; ; ; ; ; ; ;
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1099200
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Physical Review B
Additional Journal Information:
Journal Volume: 85; Journal Issue: 7; Journal ID: ISSN 1098-0121
Publisher:
American Physical Society
Country of Publication:
United States
Language:
English

Citation Formats

Zhang, L. M., Andreev, G. O., Fei, Z., McLeod, A. S., Dominguez, G., Thiemens, M., Castro-Neto, A. H., Basov, D. N., and Fogler, M. M. Near-field spectroscopy of silicon dioxide thin films. United States: N. p., 2012. Web. doi:10.1103/PhysRevB.85.075419.
Zhang, L. M., Andreev, G. O., Fei, Z., McLeod, A. S., Dominguez, G., Thiemens, M., Castro-Neto, A. H., Basov, D. N., & Fogler, M. M. Near-field spectroscopy of silicon dioxide thin films. United States. https://doi.org/10.1103/PhysRevB.85.075419
Zhang, L. M., Andreev, G. O., Fei, Z., McLeod, A. S., Dominguez, G., Thiemens, M., Castro-Neto, A. H., Basov, D. N., and Fogler, M. M. Tue . "Near-field spectroscopy of silicon dioxide thin films". United States. https://doi.org/10.1103/PhysRevB.85.075419.
@article{osti_1099200,
title = {Near-field spectroscopy of silicon dioxide thin films},
author = {Zhang, L. M. and Andreev, G. O. and Fei, Z. and McLeod, A. S. and Dominguez, G. and Thiemens, M. and Castro-Neto, A. H. and Basov, D. N. and Fogler, M. M.},
abstractNote = {},
doi = {10.1103/PhysRevB.85.075419},
journal = {Physical Review B},
number = 7,
volume = 85,
place = {United States},
year = {Tue Feb 21 00:00:00 EST 2012},
month = {Tue Feb 21 00:00:00 EST 2012}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
https://doi.org/10.1103/PhysRevB.85.075419

Citation Metrics:
Cited by: 97 works
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