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Title: Effects of nanostructuring and substrate symmetry on antiferromagnetic domain structure in LaFeO 3 thin films

Authors:
; ; ; ; ; ; ;
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1098505
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Physical Review. B. Condensed Matter and Materials Physics
Additional Journal Information:
Journal Name: Physical Review. B. Condensed Matter and Materials Physics Journal Volume: 84 Journal Issue: 22; Journal ID: ISSN 1098-0121
Publisher:
American Physical Society
Country of Publication:
United States
Language:
English

Citation Formats

Folven, E., Scholl, A., Young, A., Retterer, S. T., Boschker, J. E., Tybell, T., Takamura, Y., and Grepstad, J. K. Effects of nanostructuring and substrate symmetry on antiferromagnetic domain structure in LaFeO3 thin films. United States: N. p., 2011. Web. doi:10.1103/PhysRevB.84.220410.
Folven, E., Scholl, A., Young, A., Retterer, S. T., Boschker, J. E., Tybell, T., Takamura, Y., & Grepstad, J. K. Effects of nanostructuring and substrate symmetry on antiferromagnetic domain structure in LaFeO3 thin films. United States. doi:10.1103/PhysRevB.84.220410.
Folven, E., Scholl, A., Young, A., Retterer, S. T., Boschker, J. E., Tybell, T., Takamura, Y., and Grepstad, J. K. Wed . "Effects of nanostructuring and substrate symmetry on antiferromagnetic domain structure in LaFeO3 thin films". United States. doi:10.1103/PhysRevB.84.220410.
@article{osti_1098505,
title = {Effects of nanostructuring and substrate symmetry on antiferromagnetic domain structure in LaFeO3 thin films},
author = {Folven, E. and Scholl, A. and Young, A. and Retterer, S. T. and Boschker, J. E. and Tybell, T. and Takamura, Y. and Grepstad, J. K.},
abstractNote = {},
doi = {10.1103/PhysRevB.84.220410},
journal = {Physical Review. B. Condensed Matter and Materials Physics},
number = 22,
volume = 84,
place = {United States},
year = {2011},
month = {12}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
DOI: 10.1103/PhysRevB.84.220410

Citation Metrics:
Cited by: 11 works
Citation information provided by
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