skip to main content
DOE PAGES title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Mechanisms of Near-Ultraviolet, Nanosecond-Pulse--Laser Damage in Hf02/SIO2--Based Multilayer Coatings

Abstract

The possible role of metal clusters and electronic defects in the near-ultraviolet, nanosecond-pulse–laser damage in HfO2/SiO2-pair-based coatings is analyzed using experimental results on absorption and damage in HfO2 monolayers with and without artificially introduced Hf nanoscale absorbers. These studies reveal a damage mechanism specific to HfO2/SiO2 pair combination comprised of a high-melting-point material (HfO2), where absorption starts, and a lower-melting-point material (SiO2), where absorption can be initiated upon reaching the critical temperature. Based on this analysis we discuss possible modifications to coating designs and desirable properties of high- and low-index materials that might lead to improve nanosecond, near-ultraviolet laser-damage performance.

Authors:
 [1]
  1. Univ. of Rochester, NY (United States). Lab. for Laser Energetics
Publication Date:
Research Org.:
Univ. of Rochester, NY (United States). Lab. for Laser Energetics
Sponsoring Org.:
USDOE
OSTI Identifier:
1083476
Report Number(s):
DOE/NA/28302-1116
2012-80; 2088
Grant/Contract Number:  
FC52-08NA28302
Resource Type:
Accepted Manuscript
Journal Name:
Chinese Optics Letters
Additional Journal Information:
Journal Volume: 11; Journal Issue: S10703; Conference: Frontiers of Optical Coatings Optics, Hangzhou (China), 15-18 Oct 2012; Related Information: See doi if working: 10.3788/COL201311.S10703
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Papernov, S. Mechanisms of Near-Ultraviolet, Nanosecond-Pulse--Laser Damage in Hf02/SIO2--Based Multilayer Coatings. United States: N. p., 2013. Web.
Papernov, S. Mechanisms of Near-Ultraviolet, Nanosecond-Pulse--Laser Damage in Hf02/SIO2--Based Multilayer Coatings. United States.
Papernov, S. Fri . "Mechanisms of Near-Ultraviolet, Nanosecond-Pulse--Laser Damage in Hf02/SIO2--Based Multilayer Coatings". United States. https://www.osti.gov/servlets/purl/1083476.
@article{osti_1083476,
title = {Mechanisms of Near-Ultraviolet, Nanosecond-Pulse--Laser Damage in Hf02/SIO2--Based Multilayer Coatings},
author = {Papernov, S.},
abstractNote = {The possible role of metal clusters and electronic defects in the near-ultraviolet, nanosecond-pulse–laser damage in HfO2/SiO2-pair-based coatings is analyzed using experimental results on absorption and damage in HfO2 monolayers with and without artificially introduced Hf nanoscale absorbers. These studies reveal a damage mechanism specific to HfO2/SiO2 pair combination comprised of a high-melting-point material (HfO2), where absorption starts, and a lower-melting-point material (SiO2), where absorption can be initiated upon reaching the critical temperature. Based on this analysis we discuss possible modifications to coating designs and desirable properties of high- and low-index materials that might lead to improve nanosecond, near-ultraviolet laser-damage performance.},
doi = {},
journal = {Chinese Optics Letters},
number = S10703,
volume = 11,
place = {United States},
year = {2013},
month = {6}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
The DOI is not currently available

Save / Share: