Mechanisms of Near-Ultraviolet, Nanosecond-Pulse--Laser Damage in Hf02/SIO2--Based Multilayer Coatings
- Univ. of Rochester, NY (United States). Lab. for Laser Energetics; Laboratory for Laser Energetics, University of Rochester, Rochester, NY
The possible role of metal clusters and electronic defects in the near-ultraviolet, nanosecond-pulse–laser damage in HfO2/SiO2-pair-based coatings is analyzed using experimental results on absorption and damage in HfO2 monolayers with and without artificially introduced Hf nanoscale absorbers. These studies reveal a damage mechanism specific to HfO2/SiO2 pair combination comprised of a high-melting-point material (HfO2), where absorption starts, and a lower-melting-point material (SiO2), where absorption can be initiated upon reaching the critical temperature. Based on this analysis we discuss possible modifications to coating designs and desirable properties of high- and low-index materials that might lead to improve nanosecond, near-ultraviolet laser-damage performance.
- Research Organization:
- Univ. of Rochester, NY (United States). Lab. for Laser Energetics
- Sponsoring Organization:
- USDOE
- Grant/Contract Number:
- FC52-08NA28302
- OSTI ID:
- 1083476
- Report Number(s):
- DOE/NA/28302--1116; 2012-80; 2088
- Journal Information:
- Chinese Optics Letters, Journal Name: Chinese Optics Letters Journal Issue: S10703 Vol. 11; ISSN 1671-7694
- Publisher:
- Chinese Laser PressCopyright Statement
- Country of Publication:
- United States
- Language:
- English
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