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Title: Spectroscopic analysis of Al and N diffusion in HfO2

Authors:
 [1];  [2];  [3];  [1];  [2];  [1]
  1. SEMATECH, 257 Fuller Rd, Albany, New York 12203, USA
  2. National Institute of Standards and Technology, Gaithersburg, Maryland 20899, USA
  3. Seton Hall University, 400 South Orange Ave, South Orange, New Jersey 07079, USA
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1074854
Grant/Contract Number:  
AC02-98CH10886
Resource Type:
Published Article
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Name: Journal of Applied Physics Journal Volume: 112 Journal Issue: 6; Journal ID: ISSN 0021-8979
Publisher:
American Institute of Physics
Country of Publication:
United States
Language:
English

Citation Formats

Lysaght, P. S., Woicik, J. C., Sahiner, M. A., Price, J., Weiland, C., and Kirsch, P. D. Spectroscopic analysis of Al and N diffusion in HfO2. United States: N. p., 2012. Web. doi:10.1063/1.4754578.
Lysaght, P. S., Woicik, J. C., Sahiner, M. A., Price, J., Weiland, C., & Kirsch, P. D. Spectroscopic analysis of Al and N diffusion in HfO2. United States. doi:10.1063/1.4754578.
Lysaght, P. S., Woicik, J. C., Sahiner, M. A., Price, J., Weiland, C., and Kirsch, P. D. Wed . "Spectroscopic analysis of Al and N diffusion in HfO2". United States. doi:10.1063/1.4754578.
@article{osti_1074854,
title = {Spectroscopic analysis of Al and N diffusion in HfO2},
author = {Lysaght, P. S. and Woicik, J. C. and Sahiner, M. A. and Price, J. and Weiland, C. and Kirsch, P. D.},
abstractNote = {},
doi = {10.1063/1.4754578},
journal = {Journal of Applied Physics},
number = 6,
volume = 112,
place = {United States},
year = {2012},
month = {9}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
DOI: 10.1063/1.4754578

Citation Metrics:
Cited by: 3 works
Citation information provided by
Web of Science

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