Title:
FISSION-INDUCED VAPORIZATION OF UO2 FROM A SOURCE AND SUBSEQUENT CONDENSATION ON COLLECTORS EXPOSED TO FISSION FRAGMENT BOMBARDMENT
Subject Terms:
FUELS AND MATERIALS ENGINEERINGRADIATION AND RADIATION PROTECTIONRADIATION EFFECTSURANIUM (IV) OXIDES - VAPORIZATION
Document Location:
DOE Public Reading Room - Hanford Battelle P.O. Box 999 MS H2-53 Richland WA 99352 (509)372-7443
Publication Date:
1962 Mar 16
Declassification Status:
Declassified
Accession Number:
RL-1-381763
Document Number(s):
HW-SA-2497
Originating Research Org.:
GE - HAPO
OpenNet Entry Date:
2004 Feb 24
OpenNet Modified Date:
2015 Aug 24
Description/Abstract:
FISSIONABLE THIN FILMS OF UO2 WERE IRRADIATED IN VACUUM OPPOSITE THIN C COLLECTOR FILMS. UO2 WAS VAPORIZED BY FISSION FRAGMENT INTERACTION WITH THE SOURCE FILM & DEPOSITED ON COLLECTORS. A 200 A LAYER OF C ON THE SOURCE FILM VIRTUALLY ELIMINATES VAPORIZATION. FISSION FRAGMENT DAMAGE TO C; PT-COATED C, AND AL FOIL COLLECTORS WAS STUDIED.