Title:
CATHODIC VACUUM ETCHING OF URANIUM
Subject Terms:
FUELS AND MATERIALS ENGINEERINGGRAIN STRUCTUREMETALLOGRAPHY - SAMPLE PREPARATIONREACTOR TECHNOLOGYURANIUM - ETCHING
Document Location:
DOE Public Reading Room - Hanford Battelle P.O. Box 999 MS H2-53 Richland WA 99352 (509)372-7443
Publication Date:
1954 Aug 11
Declassification Date:
1954 Sep 29
Declassification Status:
Declassified
Accession Number:
RL-1-360628
Document Number(s):
HW-32676
Originating Research Org.:
GE - HAPO
OpenNet Entry Date:
2004 Jan 09
OpenNet Modified Date:
2015 Aug 24
Description/Abstract:
THIS REPORT DISCUSSES THE EQUIPMENT AND PROCEDURE FOR CATHODIC ETCHING OF U WITH KRYPTON AT A PRESSURE OF 75 MICRONS. IT INCLUDES PHOTOGRAPHS OF THE EQUIPMENT AND OF THE ETCHED SAMPLES (ALPHA ROLLED, BETA HEAT TREATED, AND GAMMA EXTRUDED U), MICROGRAPHS OF FAXFILM AND SILICON MONOXIDE REPLICAS, AND THE METHODS OF OBTAINING REPLICAS.