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Ionic molecular films. Applications. 3. Electron beam stimulated enhanced adherence

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Abstract

This paper reports on the advantages of the use of the technique of electron beam lithography to imprint enhanced sensitive patterns on ionic molecular substrates (bulk crystals or films). With this technique, localized superficial defects are produced which change the chemical properties of surfaces. Sensitized surfaces react with absorbates providing enhanced adherence of such substances. The use of spacially controlled electron beams allows the construction of small (sub-micron) feature chemical and very localized enhanced adherence of absorbates.
Authors:
Publication Date:
Nov 01, 1989
Product Type:
Technical Report
Report Number:
ENEA-RT-TIB-89-31; RT/TIB-89-31
Reference Number:
ITAN-90-001766; EDB-90-130404; NTS-90-021323; ERA-15-044026
Subject:
07 ISOTOPE AND RADIATION SOURCES; 36 MATERIALS SCIENCE; THIN FILMS; ELECTRON BEAM MACHINING; ABSORPTION; ADHESION; CHEMICAL PROPERTIES; CHEMICAL VAPOR DEPOSITION; CRYSTAL DEFECTS; ETCHING; IONIC CRYSTALS; MOLECULAR CRYSTALS; SURFACE PROPERTIES; CHEMICAL COATING; CRYSTAL STRUCTURE; CRYSTALS; DEPOSITION; FILMS; MACHINING; SURFACE COATING; SURFACE FINISHING; 070205* - Radiation Sources- Industrial Applications, Radiation Processing- (1987-); 360601 - Other Materials- Preparation & Manufacture; 360602 - Other Materials- Structure & Phase Studies; 360603 - Materials- Properties
OSTI ID:
7790696
Research Organizations:
ENEA, Frascati (Italy). Dipt. Tecnologie Intersettoriali di Base
Country of Origin:
Italy
Language:
English
Other Identifying Numbers:
Journal ID: ISSN 0393-6333; Other: ON: DE90514482
Availability:
NTIS (US Sales Only), PC A02/MF A01
Submitting Site:
ITAN
Size:
Pages: 9 p
Announcement Date:
Sep 15, 1990

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Citation Formats

Baldacchini, G, Montereali, R M, and Scavarda do Carmo, L C. Ionic molecular films. Applications. 3. Electron beam stimulated enhanced adherence. Italy: N. p., 1989. Web.
Baldacchini, G, Montereali, R M, & Scavarda do Carmo, L C. Ionic molecular films. Applications. 3. Electron beam stimulated enhanced adherence. Italy.
Baldacchini, G, Montereali, R M, and Scavarda do Carmo, L C. 1989. "Ionic molecular films. Applications. 3. Electron beam stimulated enhanced adherence." Italy.
@misc{etde_7790696,
title = {Ionic molecular films. Applications. 3. Electron beam stimulated enhanced adherence}
 author = {Baldacchini, G, Montereali, R M, and Scavarda do Carmo, L C}
 abstractNote = {This paper reports on the advantages of the use of the technique of electron beam lithography to imprint enhanced sensitive patterns on ionic molecular substrates (bulk crystals or films). With this technique, localized superficial defects are produced which change the chemical properties of surfaces. Sensitized surfaces react with absorbates providing enhanced adherence of such substances. The use of spacially controlled electron beams allows the construction of small (sub-micron) feature chemical and very localized enhanced adherence of absorbates.}
 place = {Italy}
 year = {1989}
 month = {Nov}
 }