Abstract
This paper describes manufacturing processes and production technologies for large area amorphous silicon photovoltaic panels for private homes. Because an amorphous solar cell can be increased of its area, SnO2 is formed and laser-scribed on a glass substrate with a size of the final product. Then, amorphous silicon is piled on it, and laser-scribed again to form a back surface electrode. By finally laser-scribing the back surface electrode, the cells are integrated in series completing a submodule. Module efficiency of this substrate is 10.6%. Kanegafuchi Chemical Company has developed a fully automated submodule back surface forming technology, which seals cells by extruding a thermally hardened liquid resin of isobutylene system in film form with a width of about 0.5 meter, coating it on a solar cell substrate, and simply heating for several minutes at 150 degC. The technology has productivity of 100 MW or more annually. If hybrid solar cells composed of thin-film polycrystalline silicon and amorphous silicon (with an efficiency of 11.5%) being studied under commission from NEDO are put into practical application in and after the year 2005, a strong spur on their proliferation in great quantity may be expected. 12 refs., 7 figs.
Tawada, Y
[1]
- Kaneka Corporation, Osaka (Japan)
Citation Formats
Tawada, Y.
Large area amorphous PV panel for private home; Jutakuyo daimenseki amorphous taiyo denchi panel no kaihatsu.
Japan: N. p.,
1998.
Web.
Tawada, Y.
Large area amorphous PV panel for private home; Jutakuyo daimenseki amorphous taiyo denchi panel no kaihatsu.
Japan.
Tawada, Y.
1998.
"Large area amorphous PV panel for private home; Jutakuyo daimenseki amorphous taiyo denchi panel no kaihatsu."
Japan.
@misc{etde_630348,
title = {Large area amorphous PV panel for private home; Jutakuyo daimenseki amorphous taiyo denchi panel no kaihatsu}
author = {Tawada, Y}
abstractNote = {This paper describes manufacturing processes and production technologies for large area amorphous silicon photovoltaic panels for private homes. Because an amorphous solar cell can be increased of its area, SnO2 is formed and laser-scribed on a glass substrate with a size of the final product. Then, amorphous silicon is piled on it, and laser-scribed again to form a back surface electrode. By finally laser-scribing the back surface electrode, the cells are integrated in series completing a submodule. Module efficiency of this substrate is 10.6%. Kanegafuchi Chemical Company has developed a fully automated submodule back surface forming technology, which seals cells by extruding a thermally hardened liquid resin of isobutylene system in film form with a width of about 0.5 meter, coating it on a solar cell substrate, and simply heating for several minutes at 150 degC. The technology has productivity of 100 MW or more annually. If hybrid solar cells composed of thin-film polycrystalline silicon and amorphous silicon (with an efficiency of 11.5%) being studied under commission from NEDO are put into practical application in and after the year 2005, a strong spur on their proliferation in great quantity may be expected. 12 refs., 7 figs.}
journal = []
issue = {1}
volume = {24}
journal type = {AC}
place = {Japan}
year = {1998}
month = {Jan}
}
title = {Large area amorphous PV panel for private home; Jutakuyo daimenseki amorphous taiyo denchi panel no kaihatsu}
author = {Tawada, Y}
abstractNote = {This paper describes manufacturing processes and production technologies for large area amorphous silicon photovoltaic panels for private homes. Because an amorphous solar cell can be increased of its area, SnO2 is formed and laser-scribed on a glass substrate with a size of the final product. Then, amorphous silicon is piled on it, and laser-scribed again to form a back surface electrode. By finally laser-scribing the back surface electrode, the cells are integrated in series completing a submodule. Module efficiency of this substrate is 10.6%. Kanegafuchi Chemical Company has developed a fully automated submodule back surface forming technology, which seals cells by extruding a thermally hardened liquid resin of isobutylene system in film form with a width of about 0.5 meter, coating it on a solar cell substrate, and simply heating for several minutes at 150 degC. The technology has productivity of 100 MW or more annually. If hybrid solar cells composed of thin-film polycrystalline silicon and amorphous silicon (with an efficiency of 11.5%) being studied under commission from NEDO are put into practical application in and after the year 2005, a strong spur on their proliferation in great quantity may be expected. 12 refs., 7 figs.}
journal = []
issue = {1}
volume = {24}
journal type = {AC}
place = {Japan}
year = {1998}
month = {Jan}
}